Abstract
Nb-Si-N films were sputtered by radio frequency powered reactive magnetron sputtering with different bias voltages. The influence of sputtering bias on the microstructure and properties of Nb-Si-N films was studied. The results reveal that as the bias voltage increases the Nb/Si ratio and the surface roughness increase. The microstructure of Nb-Si-N films is the nano-composite structure with nano-sized NbN grains embedded in amorphous SiNx phase. High sputtering bias is in favor of the growth of NbN grains in the Nb-Si-N films. As the bias increases the ε-NbN phase increases. The sheet resistance and microhardness of Nb-Si-N films also change as the bias varies. This phenomenon may be related with the ε-NbN phase in some degree.
| Original language | English |
|---|---|
| Pages (from-to) | 4931-4934 |
| Number of pages | 4 |
| Journal | Surface and Coatings Technology |
| Volume | 201 |
| Issue number | 9-11 SPEC. ISS. |
| DOIs | |
| State | Published - 26 Feb 2007 |
Keywords
- Magnetron sputtering
- Microstructure
- Nb-Si-N films
- Properties
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