Skip to main navigation Skip to search Skip to main content

Influence of processing technology on dielectric porperties of microwave window materials

  • Shi Qiu
  • , Guanjun Zhang
  • , Xiangli Wang
  • , Xianghui Lü
  • , Zhiqiang Zhang
  • Northwest Institute of Nuclear Technology

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Polytetrafluoroethylene(PTFE), polyethylene(PE), polymethyl methacrylate(PMMA) and other similar medium materials are widely used for making of output window of high power microwave(HPM), due to their favorable wave-transparent and mechanical properties. But there are few studies conducted on the influence of different processing technologies on dielectric properties of these materials. In this article, the basic dielectric parameters of different medium materials processed with different technologies are measured with high-pressure bridges and high resistance meters, and the surface electrical trap densities of these materials at the low energy level of 0.8-0.9 eV are measured with the adoption of electrostatic induction method. Medium breakdown experiments with waveguides under S band, 800 MW and 100 ns microwave pulse are conducted, and the effects of different material surface finishes on window surface breakdown are studied. The results show that, the baking technology to some extent reduces materials' resistance to breakdown, and causes more dielectric losses; the scratches parallel to the direction of electric field form the channel for material surface breakdown, leading to more serious breakdown.

Original languageEnglish
Pages (from-to)935-939
Number of pages5
JournalQiangjiguang Yu Lizishu/High Power Laser and Particle Beams
Volume25
Issue number4
DOIs
StatePublished - Apr 2013

Keywords

  • Dielectric property
  • Electron trap
  • Electrostatic induction method
  • Surface charge

Fingerprint

Dive into the research topics of 'Influence of processing technology on dielectric porperties of microwave window materials'. Together they form a unique fingerprint.

Cite this