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Influence of Magnetron Sputtering Parameters on Heat Volatilization Property of Tungsten-Rhenium Thin Film Thermocouples

  • Xi'an Jiaotong University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The working time of tungsten-rhenium (W-Re) thin film thermocouples (TFTCs) is reduced for the reason of heat volatilization under non oxidizing environment. Influence of magnetron sputtering parameters on thermal volatilization property of tungsten-rhenium TFTCs were discussed by aging test and scanning electron microscope (SEM) test. We used different gas flow rate, sputtering power and the vacuum degree to make 9 samples of TFTCs film. The aging experiment showed that the suitable magnetron sputtering parameters can reduce the heat volatilization rate to 46.5nm/h.

Original languageEnglish
Title of host publicationNEMS 2018 - 13th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages649-652
Number of pages4
ISBN (Electronic)9781538652732
DOIs
StatePublished - 3 Dec 2018
Event13th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2018 - Singapore, Singapore
Duration: 22 Apr 201826 Apr 2018

Publication series

NameNEMS 2018 - 13th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Conference

Conference13th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2018
Country/TerritorySingapore
CitySingapore
Period22/04/1826/04/18

Keywords

  • Seececk
  • TFTCs
  • magnetron sputtering

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