Influence of H2O and O2 on the main discharge mechanism in 50 Hz ac point-plane corona discharge

Qingqing Gao; Xiaohua Wang; Aijun Yang; Chunping Niu; Mingzhe Rong; Lulu Jiao; Qing Ma

doi:10.1063/1.5072777

Influence of H₂O and O₂ on the main discharge mechanism in 50 Hz ac point-plane corona discharge

Qingqing Gao
, Xiaohua Wang
, Aijun Yang
, Chunping Niu
, Mingzhe Rong
, Lulu Jiao
, Qing Ma

School of Electrical Engineering

Xi'an Jiaotong University

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

It is common to identify the internal insulation conditions of Sulfur Hexafluoride (SF₆) insulated equipment by monitoring the concentrations of SF₆ decomposition products. Corona discharge can lead to the decomposition of SF₆, and thus, a lot of reactions occur in the mixture of SF₆ with the impurities H₂O and O₂. Even under the same strength of corona discharge, the reactions can cause the decomposition products to differ due to the different concentrations of H₂O and O₂. This paper systematically studies the effects of H₂O and O₂ on the formation mechanism of SF₆ decomposition products from a theoretical perspective. Two coupled zero-dimensional chemical kinetic models were built to investigate the discharge mechanism of 50 Hz ac point-plane corona discharge. By calculating the related contributions of the pathways at different moisture and oxygen contents (from 200 ppm to 5000 ppm), the main chemical process and the influence of the moisture and oxygen contents on the main discharge mechanism are analyzed.

Original language	English
Article number	033508
Journal	Physics of Plasmas
Volume	26
Issue number	3
DOIs	https://doi.org/10.1063/1.5072777
State	Published - 1 Mar 2019

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10.1063/1.5072777

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title = "Influence of H2O and O2 on the main discharge mechanism in 50 Hz ac point-plane corona discharge",

abstract = "It is common to identify the internal insulation conditions of Sulfur Hexafluoride (SF6) insulated equipment by monitoring the concentrations of SF6 decomposition products. Corona discharge can lead to the decomposition of SF6, and thus, a lot of reactions occur in the mixture of SF6 with the impurities H2O and O2. Even under the same strength of corona discharge, the reactions can cause the decomposition products to differ due to the different concentrations of H2O and O2. This paper systematically studies the effects of H2O and O2 on the formation mechanism of SF6 decomposition products from a theoretical perspective. Two coupled zero-dimensional chemical kinetic models were built to investigate the discharge mechanism of 50 Hz ac point-plane corona discharge. By calculating the related contributions of the pathways at different moisture and oxygen contents (from 200 ppm to 5000 ppm), the main chemical process and the influence of the moisture and oxygen contents on the main discharge mechanism are analyzed.",

author = "Qingqing Gao and Xiaohua Wang and Aijun Yang and Chunping Niu and Mingzhe Rong and Lulu Jiao and Qing Ma",

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T1 - Influence of H2O and O2 on the main discharge mechanism in 50 Hz ac point-plane corona discharge

AU - Gao, Qingqing

AU - Wang, Xiaohua

AU - Yang, Aijun

AU - Niu, Chunping

AU - Rong, Mingzhe

AU - Jiao, Lulu

AU - Ma, Qing

PY - 2019/3/1

Y1 - 2019/3/1

N2 - It is common to identify the internal insulation conditions of Sulfur Hexafluoride (SF6) insulated equipment by monitoring the concentrations of SF6 decomposition products. Corona discharge can lead to the decomposition of SF6, and thus, a lot of reactions occur in the mixture of SF6 with the impurities H2O and O2. Even under the same strength of corona discharge, the reactions can cause the decomposition products to differ due to the different concentrations of H2O and O2. This paper systematically studies the effects of H2O and O2 on the formation mechanism of SF6 decomposition products from a theoretical perspective. Two coupled zero-dimensional chemical kinetic models were built to investigate the discharge mechanism of 50 Hz ac point-plane corona discharge. By calculating the related contributions of the pathways at different moisture and oxygen contents (from 200 ppm to 5000 ppm), the main chemical process and the influence of the moisture and oxygen contents on the main discharge mechanism are analyzed.

AB - It is common to identify the internal insulation conditions of Sulfur Hexafluoride (SF6) insulated equipment by monitoring the concentrations of SF6 decomposition products. Corona discharge can lead to the decomposition of SF6, and thus, a lot of reactions occur in the mixture of SF6 with the impurities H2O and O2. Even under the same strength of corona discharge, the reactions can cause the decomposition products to differ due to the different concentrations of H2O and O2. This paper systematically studies the effects of H2O and O2 on the formation mechanism of SF6 decomposition products from a theoretical perspective. Two coupled zero-dimensional chemical kinetic models were built to investigate the discharge mechanism of 50 Hz ac point-plane corona discharge. By calculating the related contributions of the pathways at different moisture and oxygen contents (from 200 ppm to 5000 ppm), the main chemical process and the influence of the moisture and oxygen contents on the main discharge mechanism are analyzed.

UR - https://www.scopus.com/pages/publications/85062822118

U2 - 10.1063/1.5072777

DO - 10.1063/1.5072777

M3 - 文章

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SN - 1070-664X

VL - 26

JO - Physics of Plasmas

JF - Physics of Plasmas

IS - 3

M1 - 033508

ER -

Influence of H₂O and O₂ on the main discharge mechanism in 50 Hz ac point-plane corona discharge

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