Improved irradiation tolerance of W thin films with homogeneously multilayered structure

M. J. Peng; J. J. Yang; F. F. Zhang; C. Y. Lu; L. M. Wang; J. L. Liao; Y. Y. Yang; N. Liu

doi:10.1016/j.surfcoat.2017.01.091

Improved irradiation tolerance of W thin films with homogeneously multilayered structure

M. J. Peng
, J. J. Yang
, F. F. Zhang
, C. Y. Lu
, L. M. Wang
, J. L. Liao
, Y. Y. Yang
, N. Liu

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

We report an improved irradiation tolerance of W films by utilizing homogeneously multilayered (HM) structure design. The HM-W film was fabricated by multi-step sputtering, in which the grain boundary density λ could be increased by decreasing the individual layer thickness P_m of the film. The HM structure can improve the film irradiation resistance, in which both He bubble density ρ and average size δ continuously decreased with decreasing P_m. Meanwhile, the irradiation hardening was alleviated by decreasing P_m, while the irradiation-induced phase transition was insensitive to P_m. Our study could provide a promising way to modify the structures of thin films to promote their irradiation resistance.

Original language	English
Pages (from-to)	230-235
Number of pages	6
Journal	Surface and Coatings Technology
Volume	313
DOIs	https://doi.org/10.1016/j.surfcoat.2017.01.091
State	Published - 15 Mar 2017
Externally published	Yes

Keywords

Irradiation
Magnetron sputtering
Multilayer
W film

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10.1016/j.surfcoat.2017.01.091

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title = "Improved irradiation tolerance of W thin films with homogeneously multilayered structure",

abstract = "We report an improved irradiation tolerance of W films by utilizing homogeneously multilayered (HM) structure design. The HM-W film was fabricated by multi-step sputtering, in which the grain boundary density λ could be increased by decreasing the individual layer thickness Pm of the film. The HM structure can improve the film irradiation resistance, in which both He bubble density ρ and average size δ continuously decreased with decreasing Pm. Meanwhile, the irradiation hardening was alleviated by decreasing Pm, while the irradiation-induced phase transition was insensitive to Pm. Our study could provide a promising way to modify the structures of thin films to promote their irradiation resistance.",

keywords = "Irradiation, Magnetron sputtering, Multilayer, W film",

author = "Peng, \{M. J.\} and Yang, \{J. J.\} and Zhang, \{F. F.\} and Lu, \{C. Y.\} and Wang, \{L. M.\} and Liao, \{J. L.\} and Yang, \{Y. Y.\} and N. Liu",

note = "Publisher Copyright: {\textcopyright} 2017",

year = "2017",

month = mar,

day = "15",

doi = "10.1016/j.surfcoat.2017.01.091",

language = "英语",

volume = "313",

pages = "230--235",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Improved irradiation tolerance of W thin films with homogeneously multilayered structure

AU - Peng, M. J.

AU - Yang, J. J.

AU - Zhang, F. F.

AU - Lu, C. Y.

AU - Wang, L. M.

AU - Liao, J. L.

AU - Yang, Y. Y.

AU - Liu, N.

PY - 2017/3/15

Y1 - 2017/3/15

N2 - We report an improved irradiation tolerance of W films by utilizing homogeneously multilayered (HM) structure design. The HM-W film was fabricated by multi-step sputtering, in which the grain boundary density λ could be increased by decreasing the individual layer thickness Pm of the film. The HM structure can improve the film irradiation resistance, in which both He bubble density ρ and average size δ continuously decreased with decreasing Pm. Meanwhile, the irradiation hardening was alleviated by decreasing Pm, while the irradiation-induced phase transition was insensitive to Pm. Our study could provide a promising way to modify the structures of thin films to promote their irradiation resistance.

AB - We report an improved irradiation tolerance of W films by utilizing homogeneously multilayered (HM) structure design. The HM-W film was fabricated by multi-step sputtering, in which the grain boundary density λ could be increased by decreasing the individual layer thickness Pm of the film. The HM structure can improve the film irradiation resistance, in which both He bubble density ρ and average size δ continuously decreased with decreasing Pm. Meanwhile, the irradiation hardening was alleviated by decreasing Pm, while the irradiation-induced phase transition was insensitive to Pm. Our study could provide a promising way to modify the structures of thin films to promote their irradiation resistance.

KW - Irradiation

KW - Magnetron sputtering

KW - Multilayer

KW - W film

UR - https://www.scopus.com/pages/publications/85010936423

U2 - 10.1016/j.surfcoat.2017.01.091

DO - 10.1016/j.surfcoat.2017.01.091

M3 - 文章

AN - SCOPUS:85010936423

SN - 0257-8972

VL - 313

SP - 230

EP - 235

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Improved irradiation tolerance of W thin films with homogeneously multilayered structure

Abstract

Keywords

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