Abstract
In polymer dielectric energy storage, even polymers with high glass transition temperatures suffer significant degradation in energy storage performance as temperature increases, primarily due to a sharp rise in electrical conduction loss. In this study, we employ atomic layer deposition to coat the surface of a PEI/PVDF blend film with an Al2O3 inorganic layer to enhance its energy storage performance at high temperatures. The influence of the inorganic layer's thickness on high-temperature energy storage performance is thoroughly analyzed. Experimental results and finite element simulations demonstrate that an ultra-thin Al2O3 inorganic layer with the thickness of 50 nm effectively reduces leakage current density and mitigates space charge accumulation within the PEI/PVDF blends, thereby improving the high-temperature energy storage performance of the blends. Notably, under an applied electric field of 500 MV/m at 150 °C, the PEI/PVDF blend film with 50 nm Al2O3 layer achieved a discharge energy density of 5.45 J/cm3 and a charge-discharge efficiency of 97.75 %.
| Original language | English |
|---|---|
| Article number | 115156 |
| Journal | Journal of Energy Storage |
| Volume | 109 |
| DOIs | |
| State | Published - 15 Feb 2025 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
Keywords
- Atomic layer deposition
- Dielectric polymer
- Energy storage
- High-temperature
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