Abstract
High-order diffraction is preferred to nanoscale displacement measurement by linear optical encoder. The diffraction efficiency at high orders, however, is limited. In this Letter, a high-order diffraction grating with an isosceles triangle profile in cross-section is proposed, and it could achieve over 40% in the diffraction efficiency of the ±4th order. Fabricated by anisotropic etching of Si (100) and followed by replication, the grating period is 4.82 μm and the symmetrical side angle for diffraction is 46.1°. Experiments indicate that, by the interference of ±4th order (optical subdivision is 8 times), the positioning accuracy in 1 mm travel length is 37.1 nm, the repeatability is 3.7 nm, and the stability is 3.6 nm @ 60 s, which are measured by the standard deviation (σ).
| Original language | English |
|---|---|
| Pages (from-to) | 7187-7190 |
| Number of pages | 4 |
| Journal | Optics Letters |
| Volume | 50 |
| Issue number | 23 |
| DOIs | |
| State | Published - 1 Dec 2025 |
Fingerprint
Dive into the research topics of 'High-order diffraction gratings with an isosceles triangle profile for a nano-precision linear optical encoder'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver