Hetero-Orientation Epitaxial Growth of TiO2 Splats on Polycrystalline TiO2 Substrate

Lin Chen; Guan Jun Yang

doi:10.1007/s11666-018-0722-2

Hetero-Orientation Epitaxial Growth of TiO₂ Splats on Polycrystalline TiO₂ Substrate

Lin Chen
, Guan Jun Yang

School of Materials Science and Engineering

Xi'an Jiaotong University

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

In the present study, the effect of titania (TiO₂) substrate grain size and orientation on the epitaxial growth of TiO₂ splat was investigated. Interestingly, the splat presented comparable grain size with that of substrate, indicating the hereditary feature of grain size. In addition, hetero- and homo-orientation epitaxial growth was observed at deposition temperatures below 400 °C and above 500 °C, respectively. The preferential growth of high-energy (001) face was also observed at low deposition temperatures (≤ 400 °C), which was found to result from dynamic nonequilibrium effect during the thermal spray deposition. Moreover, thermal spray deposition paves the way for a new approach to prepare high-energy (001) facets of TiO₂ crystals.

Original language	English
Pages (from-to)	880-897
Number of pages	18
Journal	Journal of Thermal Spray Technology
Volume	27
Issue number	5
DOIs	https://doi.org/10.1007/s11666-018-0722-2
State	Published - 1 Jun 2018

Keywords

crystal morphology
deposition temperature
hereditary feature
hetero-orientation epitaxial growth
homo-orientation epitaxial growth
preferential growth

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10.1007/s11666-018-0722-2

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title = "Hetero-Orientation Epitaxial Growth of TiO2 Splats on Polycrystalline TiO2 Substrate",

abstract = "In the present study, the effect of titania (TiO2) substrate grain size and orientation on the epitaxial growth of TiO2 splat was investigated. Interestingly, the splat presented comparable grain size with that of substrate, indicating the hereditary feature of grain size. In addition, hetero- and homo-orientation epitaxial growth was observed at deposition temperatures below 400 °C and above 500 °C, respectively. The preferential growth of high-energy (001) face was also observed at low deposition temperatures (≤ 400 °C), which was found to result from dynamic nonequilibrium effect during the thermal spray deposition. Moreover, thermal spray deposition paves the way for a new approach to prepare high-energy (001) facets of TiO2 crystals.",

keywords = "crystal morphology, deposition temperature, hereditary feature, hetero-orientation epitaxial growth, homo-orientation epitaxial growth, preferential growth",

author = "Lin Chen and Yang, \{Guan Jun\}",

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doi = "10.1007/s11666-018-0722-2",

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TY - JOUR

T1 - Hetero-Orientation Epitaxial Growth of TiO2 Splats on Polycrystalline TiO2 Substrate

AU - Chen, Lin

AU - Yang, Guan Jun

PY - 2018/6/1

Y1 - 2018/6/1

N2 - In the present study, the effect of titania (TiO2) substrate grain size and orientation on the epitaxial growth of TiO2 splat was investigated. Interestingly, the splat presented comparable grain size with that of substrate, indicating the hereditary feature of grain size. In addition, hetero- and homo-orientation epitaxial growth was observed at deposition temperatures below 400 °C and above 500 °C, respectively. The preferential growth of high-energy (001) face was also observed at low deposition temperatures (≤ 400 °C), which was found to result from dynamic nonequilibrium effect during the thermal spray deposition. Moreover, thermal spray deposition paves the way for a new approach to prepare high-energy (001) facets of TiO2 crystals.

AB - In the present study, the effect of titania (TiO2) substrate grain size and orientation on the epitaxial growth of TiO2 splat was investigated. Interestingly, the splat presented comparable grain size with that of substrate, indicating the hereditary feature of grain size. In addition, hetero- and homo-orientation epitaxial growth was observed at deposition temperatures below 400 °C and above 500 °C, respectively. The preferential growth of high-energy (001) face was also observed at low deposition temperatures (≤ 400 °C), which was found to result from dynamic nonequilibrium effect during the thermal spray deposition. Moreover, thermal spray deposition paves the way for a new approach to prepare high-energy (001) facets of TiO2 crystals.

KW - crystal morphology

KW - deposition temperature

KW - hereditary feature

KW - hetero-orientation epitaxial growth

KW - homo-orientation epitaxial growth

KW - preferential growth

UR - https://www.scopus.com/pages/publications/85046545132

U2 - 10.1007/s11666-018-0722-2

DO - 10.1007/s11666-018-0722-2

M3 - 文章

AN - SCOPUS:85046545132

SN - 1059-9630

VL - 27

SP - 880

EP - 897

JO - Journal of Thermal Spray Technology

JF - Journal of Thermal Spray Technology

IS - 5

ER -

Hetero-Orientation Epitaxial Growth of TiO₂ Splats on Polycrystalline TiO₂ Substrate

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