Abstract
The physical mechanism of g-r noise induced by deep-level defects in the emitter space-charge region for bipolar transistors is analyzed quantitatively and a new model on g-r noise in bipolar transistors is developed. The experimental dependence of g-r noise on the bias voltage is explained from the model. Based on the model, the deep-level parameters in bipolar devices are determined by means of g-r noise measurement.
| Original language | English |
|---|---|
| Pages (from-to) | 111-114 |
| Number of pages | 4 |
| Journal | Tien Tzu Hsueh Pao/Acta Electronica Sinica |
| Volume | 24 |
| Issue number | 8 |
| State | Published - Aug 1996 |
| Externally published | Yes |