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g-C3N4 基 S 型异质结光催化剂的制备方法和应用

Translated title of the contribution: Preparation methods and applications of g-C3N4-based S-scheme heterojunction photocatalysts
  • Zhiping Liu
  • , Yuan Yu
  • , Dewen Zhang
  • , Rongqian Wu
  • , Yi Lyu
  • , Xiaofei Liu
  • The First Affiliated Hospital of Xi’an Jiaotong University
  • Xi'an Jiaotong University

Research output: Contribution to journalArticlepeer-review

Abstract

Semiconductor photocatalysis is a technology that utilizes solar energy to excite catalysts, generating photogenerated carriers with redox capabilities. It has been widely applied across various fields. Graphitic carbon nitride (g-C3N4), as a non-polluting semiconductor, has garnered attention in the field of photocatalysis. However, its further development is limited by a high rate of photogenerated carrier recombination and low utilization of visible light. Constructing g-C3N4-based S-scheme heterojunctions is an effective strategy to address the issue of intrinsic charge carrier recombination, enabling effective spatial separation of charge carriers, reducing recombination rates, and enhancing photocatalytic performance. This article first introduces the mechanism of S-scheme heterojunctions, then focuses on the characteristics of preparation methods for g-C3N4-based S-scheme heterojunctions and their applications in different areas. Finally, it proposes the prospects and challenges faced by g-C3N4-based S-scheme heterojunctions in the field of photocatalysis.

Translated title of the contributionPreparation methods and applications of g-C3N4-based S-scheme heterojunction photocatalysts
Original languageChinese (Traditional)
Pages (from-to)8070-8079
Number of pages10
JournalGongneng Cailiao/Journal of Functional Materials
Volume56
Issue number8
DOIs
StatePublished - 30 Aug 2025

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