Fabrication of three-dimensional microchannels inside silicon using a femtosecond laser

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Abstract

We report on photo-induced microchannels created within single-crystal silicon using 800 nm femtosecond laser pulses. The 800 nm wavelength is in the absorption region of silicon. Using combined transverse scanning and longitudinal scanning, we can fabricate arbitrary three-dimensional microchannels in the interior of silicon, to a depth of several hundred micrometers, without surface damage. The diameter of the photo-induced microchannels can be controlled by varying laser power, scan velocity and focal depth.

Original languageEnglish
Article number125007
JournalJournal of Micromechanics and Microengineering
Volume19
Issue number12
DOIs
StatePublished - 2009

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