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Fabrication of poly-Si TFTs on fine quartz fibers for display applications

  • A. Mimura
  • , Y. Sugawara
  • , M. Hiroshima
  • , T. Ikehara
  • , R. Maeda
  • , K. Suzuki
  • , K. Yase
  • , I. Shuu
  • , A. Nakajima
  • , S. Toda
  • , H. Koaizawa
  • National Institute of Advanced Industrial Science and Technology
  • Nara Institute of Science and Technology
  • Furukawa Electric Co., Ltd.

Research output: Contribution to conferencePaperpeer-review

1 Scopus citations

Abstract

Top-gate type poly-Si thin film transistors (TFTs) were fabricated on fine quartz fibers using one-dimensional substrate processing for display applications. Resist-spray-coating, which has been used in MEMS fabrication, was applied to treat the long fibers. Maximum process temperature was 600°C. Successful operations of both n- and p- channel TFTs were confirmed.

Original languageEnglish
Pages1975-1976
Number of pages2
StatePublished - 2007
Externally publishedYes
Event14th International Display Workshops, IDW '07 - Sapporo, Japan
Duration: 5 Dec 20075 Dec 2007

Conference

Conference14th International Display Workshops, IDW '07
Country/TerritoryJapan
CitySapporo
Period5/12/075/12/07

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