Fabrication of nanogap electrode using electromigration method during metal deposition

  • Tatsuhiko Ohata
  • , Yasuhisa Naitoh
  • , Masayo Horikawa
  • , Dong F. Wang
  • , Ryutaro Maeda

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

In this paper, we suggest a new electormigration method to improve the previous electromigration method. The method is that electrical break-down is carried out during metal deposition for the fabrication of electrodes. As a result, the nanogap structure can be confirmed and break-down current showed lower magnitudes than the previous method. These result indicated possibility of applications to mass production of nanogap electrodes.

Original languageEnglish
Title of host publication2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
Pages290-293
Number of pages4
DOIs
StatePublished - 2012
Externally publishedYes
Event7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012 - Kyoto, Japan
Duration: 5 Mar 20128 Mar 2012

Publication series

Name2012 7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012

Conference

Conference7th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2012
Country/TerritoryJapan
CityKyoto
Period5/03/128/03/12

Keywords

  • electromigration
  • nanogap

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