Fabrication of dual-termination Schottky barrier diode by using oxygen-/fluorine-terminated diamond

  • Dan Zhao
  • , Zhangcheng Liu
  • , Juan Wang
  • , Yan Liang
  • , Muhammad Nauman
  • , Jiao Fu
  • , Yan Feng Wang
  • , Shuwei Fan
  • , Wei Wang
  • , Hong Xing Wang

Research output: Contribution to journalArticlepeer-review

22 Scopus citations

Abstract

Fabrication of dual-termination Schottky barrier diode (SBD DT ) by using oxygen-/fluorine-terminated diamond (OT-/FT-diamond) has been carried out on P-/P+ diamond. X-ray photoelectron spectroscopy (XPS) measurement was used to determine the chemical composition of OT-/FT-diamond surface treated by ultraviolet ozone and C 4 F 8 plasma, respectively. The barrier heights of Au on OT-/FT-diamond were calculated to be 2.0 ± 0.12 and 2.39 ± 0.12 eV, respectively. Au film was patterned on the OT-/FT-diamond as the schottky electrode, and Ti/Au film were deposited on the backside of substrate as ohmic electrode, then a SBD DT was achieved completely. SBD DT exhibits better forward and reverse I-V characteristics based on the optimum OT-/FT-diamond (W O /W F ) area ratio 0.2, which illustrates that the combination of dual surface termination is an efficient way to optimize the performance of diamond SBD.

Original languageEnglish
Pages (from-to)411-416
Number of pages6
JournalApplied Surface Science
Volume457
DOIs
StatePublished - 1 Nov 2018

Keywords

  • Barrier height
  • OT-/FT-diamond
  • SBD
  • Surface treatment
  • XPS

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