Fabrication of carbon nanoneedle and carbon nanowall mixture film with two-step growth method

Hong Xing Wang; Nan Jiang; Hui Zhang; Akio Hiraki; Ren An Bu

doi:10.1016/j.matlet.2010.09.021

Fabrication of carbon nanoneedle and carbon nanowall mixture film with two-step growth method

Hong Xing Wang
, Nan Jiang
, Hui Zhang
, Akio Hiraki
, Ren An Bu

Seki Technotron Corp.
Kochi University of Technology
Xi'an Jiaotong University

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

A novel nano-carbon electron emitter film has been developed on a stainless steel substrate by a direct current plasma chemical vapor deposition system. Samples grown at temperatures of 900 °C and 1100 °C showed different surface morphologies. It is found that a two-step growth process established by combining these two temperature growths together is suitable for deposition of a high density emitter array film. The as-grown nano-carbon film indicates a carbon nanoneedle and carbon nanowall mixture film, where the needle array density is about 3 × 10⁷/cm². The I-V characteristic shows an emission current density of 228 mA/cm² at 2.5 V/μm, and the field emission current is stable, making it possibly suitable for developing field emission devices.

Original language	English
Pages (from-to)	78-81
Number of pages	4
Journal	Materials Letters
Volume	65
Issue number	1
DOIs	https://doi.org/10.1016/j.matlet.2010.09.021
State	Published - 15 Jan 2011
Externally published	Yes

Keywords

CVD
Field emission
Nano-carbon film
Nucleation

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10.1016/j.matlet.2010.09.021

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title = "Fabrication of carbon nanoneedle and carbon nanowall mixture film with two-step growth method",

abstract = "A novel nano-carbon electron emitter film has been developed on a stainless steel substrate by a direct current plasma chemical vapor deposition system. Samples grown at temperatures of 900 °C and 1100 °C showed different surface morphologies. It is found that a two-step growth process established by combining these two temperature growths together is suitable for deposition of a high density emitter array film. The as-grown nano-carbon film indicates a carbon nanoneedle and carbon nanowall mixture film, where the needle array density is about 3 × 107/cm2. The I-V characteristic shows an emission current density of 228 mA/cm2 at 2.5 V/μm, and the field emission current is stable, making it possibly suitable for developing field emission devices.",

keywords = "CVD, Field emission, Nano-carbon film, Nucleation",

author = "Wang, \{Hong Xing\} and Nan Jiang and Hui Zhang and Akio Hiraki and Bu, \{Ren An\}",

year = "2011",

month = jan,

day = "15",

doi = "10.1016/j.matlet.2010.09.021",

language = "英语",

volume = "65",

pages = "78--81",

journal = "Materials Letters",

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publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Fabrication of carbon nanoneedle and carbon nanowall mixture film with two-step growth method

AU - Wang, Hong Xing

AU - Jiang, Nan

AU - Zhang, Hui

AU - Hiraki, Akio

AU - Bu, Ren An

PY - 2011/1/15

Y1 - 2011/1/15

N2 - A novel nano-carbon electron emitter film has been developed on a stainless steel substrate by a direct current plasma chemical vapor deposition system. Samples grown at temperatures of 900 °C and 1100 °C showed different surface morphologies. It is found that a two-step growth process established by combining these two temperature growths together is suitable for deposition of a high density emitter array film. The as-grown nano-carbon film indicates a carbon nanoneedle and carbon nanowall mixture film, where the needle array density is about 3 × 107/cm2. The I-V characteristic shows an emission current density of 228 mA/cm2 at 2.5 V/μm, and the field emission current is stable, making it possibly suitable for developing field emission devices.

AB - A novel nano-carbon electron emitter film has been developed on a stainless steel substrate by a direct current plasma chemical vapor deposition system. Samples grown at temperatures of 900 °C and 1100 °C showed different surface morphologies. It is found that a two-step growth process established by combining these two temperature growths together is suitable for deposition of a high density emitter array film. The as-grown nano-carbon film indicates a carbon nanoneedle and carbon nanowall mixture film, where the needle array density is about 3 × 107/cm2. The I-V characteristic shows an emission current density of 228 mA/cm2 at 2.5 V/μm, and the field emission current is stable, making it possibly suitable for developing field emission devices.

KW - CVD

KW - Field emission

KW - Nano-carbon film

KW - Nucleation

UR - https://www.scopus.com/pages/publications/77957746908

U2 - 10.1016/j.matlet.2010.09.021

DO - 10.1016/j.matlet.2010.09.021

M3 - 文章

AN - SCOPUS:77957746908

SN - 0167-577X

VL - 65

SP - 78

EP - 81

JO - Materials Letters

JF - Materials Letters

IS - 1

ER -

Fabrication of carbon nanoneedle and carbon nanowall mixture film with two-step growth method

Abstract

Keywords

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