Extreme ultraviolet source development: A comparison of different concepts

G. Schriever; M. Rahe; U. Rebhan; D. Basting; W. J. Walecki; H. Lauth; R. Lebert; K. Bergmann; D. Hoffmann; O. Rosier; W. Neff; R. Poprawe; R. Sauerbrey; H. Schwoerer; S. Düesterer; D. Ziener; P. Nickles; H. Stiehl; I. Will; W. Sandner; G. Schmahl; D. Rudolph

doi:10.1117/12.406662

Extreme ultraviolet source development: A comparison of different concepts

G. Schriever
, M. Rahe
, U. Rebhan
, D. Basting
, W. J. Walecki
, H. Lauth
, R. Lebert
, K. Bergmann
, D. Hoffmann
, O. Rosier
, W. Neff
, R. Poprawe
, R. Sauerbrey
, H. Schwoerer
, S. Düesterer
, D. Ziener
, P. Nickles
, H. Stiehl
, I. Will
, W. Sandner

G. Schmahl, D. Rudolph

Coherent Inc.
Jenoptik AG
Fraunhofer Institute for Laser Technology
Friedrich Schiller University Jena
Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy
Gustav August Universität Güttingen

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik, Friedrich-Schiller Universitaet Jena, Max-Born Institut Berlin, and Gustav August Universitaet Goettingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.

Original language	English
Pages (from-to)	113-120
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4146
Issue number	1
DOIs	https://doi.org/10.1117/12.406662
State	Published - 8 Nov 2000
Externally published	Yes

Keywords

EUV source
Extreme ultraviolet
Gas discharge source
Laser produced plasma
Z-pinch

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10.1117/12.406662

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Schriever, G., Rahe, M., Rebhan, U., Basting, D., Walecki, W. J., Lauth, H., Lebert, R., Bergmann, K., Hoffmann, D., Rosier, O., Neff, W., Poprawe, R., Sauerbrey, R., Schwoerer, H., Düesterer, S., Ziener, D., Nickles, P., Stiehl, H., Will, I., ... Rudolph, D. (2000). Extreme ultraviolet source development: A comparison of different concepts. Proceedings of SPIE - The International Society for Optical Engineering, 4146(1), 113-120. https://doi.org/10.1117/12.406662

@article{df9d1ec0b6a34448a45b4fcb7f6f4141,

title = "Extreme ultraviolet source development: A comparison of different concepts",

abstract = "We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik, Friedrich-Schiller Universitaet Jena, Max-Born Institut Berlin, and Gustav August Universitaet Goettingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.",

keywords = "EUV source, Extreme ultraviolet, Gas discharge source, Laser produced plasma, Z-pinch",

author = "G. Schriever and M. Rahe and U. Rebhan and D. Basting and Walecki, \{W. J.\} and H. Lauth and R. Lebert and K. Bergmann and D. Hoffmann and O. Rosier and W. Neff and R. Poprawe and R. Sauerbrey and H. Schwoerer and S. D{\"u}esterer and D. Ziener and P. Nickles and H. Stiehl and I. Will and W. Sandner and G. Schmahl and D. Rudolph",

year = "2000",

month = nov,

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doi = "10.1117/12.406662",

language = "英语",

volume = "4146",

pages = "113--120",

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Schriever, G, Rahe, M, Rebhan, U, Basting, D, Walecki, WJ, Lauth, H, Lebert, R, Bergmann, K, Hoffmann, D, Rosier, O, Neff, W, Poprawe, R, Sauerbrey, R, Schwoerer, H, Düesterer, S, Ziener, D, Nickles, P, Stiehl, H, Will, I, Sandner, W, Schmahl, G & Rudolph, D 2000, 'Extreme ultraviolet source development: A comparison of different concepts', Proceedings of SPIE - The International Society for Optical Engineering, vol. 4146, no. 1, pp. 113-120. https://doi.org/10.1117/12.406662

TY - JOUR

T1 - Extreme ultraviolet source development

T2 - A comparison of different concepts

AU - Schriever, G.

AU - Rahe, M.

AU - Rebhan, U.

AU - Basting, D.

AU - Walecki, W. J.

AU - Lauth, H.

AU - Lebert, R.

AU - Bergmann, K.

AU - Hoffmann, D.

AU - Rosier, O.

AU - Neff, W.

AU - Poprawe, R.

AU - Sauerbrey, R.

AU - Schwoerer, H.

AU - Düesterer, S.

AU - Ziener, D.

AU - Nickles, P.

AU - Stiehl, H.

AU - Will, I.

AU - Sandner, W.

AU - Schmahl, G.

AU - Rudolph, D.

PY - 2000/11/8

Y1 - 2000/11/8

N2 - We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik, Friedrich-Schiller Universitaet Jena, Max-Born Institut Berlin, and Gustav August Universitaet Goettingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.

AB - We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by Fraunhofer-Institut fuer Lasertechnik, Friedrich-Schiller Universitaet Jena, Max-Born Institut Berlin, and Gustav August Universitaet Goettingen. The later efforts are supported by German government and steered by the industrial consortium led by Lambda Physik.

KW - EUV source

KW - Extreme ultraviolet

KW - Gas discharge source

KW - Laser produced plasma

KW - Z-pinch

UR - https://www.scopus.com/pages/publications/0000125683

U2 - 10.1117/12.406662

DO - 10.1117/12.406662

M3 - 文章

AN - SCOPUS:0000125683

SN - 0277-786X

VL - 4146

SP - 113

EP - 120

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

IS - 1

ER -

Extreme ultraviolet source development: A comparison of different concepts

Abstract

Keywords

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