Evaluation of X-ray reflectivity of a MEMS X-ray optic

I. Mitsuishi; Y. Ezoe; M. Koshiishi; M. Mita; Y. Maeda; N. Y. Yamasaki; K. Mitsuda; T. Shirata; T. Hayashi; T. Takano; R. Maeda

doi:10.1109/OMEMS.2008.4607850

Evaluation of X-ray reflectivity of a MEMS X-ray optic

I. Mitsuishi
, Y. Ezoe
, M. Koshiishi
, M. Mita
, Y. Maeda
, N. Y. Yamasaki
, K. Mitsuda
, T. Shirata
, T. Hayashi
, T. Takano
, R. Maeda

Japan Aerospace Exploration Agency
Tokyo Metropolitan University
National Institute of Adbanced Industrial Science and Technology (A1ST

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Scopus citations

Abstract

X-ray reflectivity of an ultra light-weight X-ray optic using MEMS technologies was measured in two different energies (0.28 keV and 1.49 keV). The obtained reflectivities can be understood by considering the mirror surface structures.

Original language	English
Title of host publication	2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
Pages	104-105
Number of pages	2
DOIs	https://doi.org/10.1109/OMEMS.2008.4607850
State	Published - 2008
Externally published	Yes
Event	2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS - Freiburg, Germany Duration: 11 Aug 2008 → 14 Aug 2008

Publication series

Name	2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS

Conference

Conference	2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS
Country/Territory	Germany
City	Freiburg
Period	11/08/08 → 14/08/08

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10.1109/OMEMS.2008.4607850

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Mitsuishi, I., Ezoe, Y., Koshiishi, M., Mita, M., Maeda, Y., Yamasaki, N. Y., Mitsuda, K., Shirata, T., Hayashi, T., Takano, T., & Maeda, R. (2008). Evaluation of X-ray reflectivity of a MEMS X-ray optic. In 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS (pp. 104-105). Article 4607850 (2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS). https://doi.org/10.1109/OMEMS.2008.4607850

@inproceedings{27c1ad9e75ce48f496c39e8f00a5d029,

title = "Evaluation of X-ray reflectivity of a MEMS X-ray optic",

abstract = "X-ray reflectivity of an ultra light-weight X-ray optic using MEMS technologies was measured in two different energies (0.28 keV and 1.49 keV). The obtained reflectivities can be understood by considering the mirror surface structures.",

author = "I. Mitsuishi and Y. Ezoe and M. Koshiishi and M. Mita and Y. Maeda and Yamasaki, \{N. Y.\} and K. Mitsuda and T. Shirata and T. Hayashi and T. Takano and R. Maeda",

year = "2008",

doi = "10.1109/OMEMS.2008.4607850",

language = "英语",

isbn = "9781424419180",

series = "2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS",

pages = "104--105",

booktitle = "2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS",

note = "2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS ; Conference date: 11-08-2008 Through 14-08-2008",

}

Mitsuishi, I, Ezoe, Y, Koshiishi, M, Mita, M, Maeda, Y, Yamasaki, NY, Mitsuda, K, Shirata, T, Hayashi, T, Takano, T & Maeda, R 2008, Evaluation of X-ray reflectivity of a MEMS X-ray optic. in 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS., 4607850, 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, pp. 104-105, 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, Freiburg, Germany, 11/08/08. https://doi.org/10.1109/OMEMS.2008.4607850

Evaluation of X-ray reflectivity of a MEMS X-ray optic. / Mitsuishi, I.; Ezoe, Y.; Koshiishi, M. et al.
2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS. 2008. p. 104-105 4607850 (2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Evaluation of X-ray reflectivity of a MEMS X-ray optic

AU - Mitsuishi, I.

AU - Ezoe, Y.

AU - Koshiishi, M.

AU - Mita, M.

AU - Maeda, Y.

AU - Yamasaki, N. Y.

AU - Mitsuda, K.

AU - Shirata, T.

AU - Hayashi, T.

AU - Takano, T.

AU - Maeda, R.

PY - 2008

Y1 - 2008

N2 - X-ray reflectivity of an ultra light-weight X-ray optic using MEMS technologies was measured in two different energies (0.28 keV and 1.49 keV). The obtained reflectivities can be understood by considering the mirror surface structures.

AB - X-ray reflectivity of an ultra light-weight X-ray optic using MEMS technologies was measured in two different energies (0.28 keV and 1.49 keV). The obtained reflectivities can be understood by considering the mirror surface structures.

UR - https://www.scopus.com/pages/publications/54049094868

U2 - 10.1109/OMEMS.2008.4607850

DO - 10.1109/OMEMS.2008.4607850

M3 - 会议稿件

AN - SCOPUS:54049094868

SN - 9781424419180

T3 - 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS

SP - 104

EP - 105

BT - 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS

T2 - 2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS

Y2 - 11 August 2008 through 14 August 2008

ER -

Evaluation of X-ray reflectivity of a MEMS X-ray optic

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