Erratum: Nanotwin formation in copper thin films by stress/strain relaxation in pulse electrodeposition (Applied Physics Letters (2007) 91 (254105))

Di Xu; Wei Lek Kwan; Kai Chen; Xi Zhang; Vidvuds Ozolins; King Ning Tu

doi:10.1063/1.3489689

Erratum: Nanotwin formation in copper thin films by stress/strain relaxation in pulse electrodeposition (Applied Physics Letters (2007) 91 (254105))

Di Xu
, Wei Lek Kwan
, Kai Chen
, Xi Zhang
, Vidvuds Ozolins
, King Ning Tu

University of California at Los Angeles

Research output: Contribution to journal › Comment/debate

2 Scopus citations

Original language	English
Article number	129904
Journal	Applied Physics Letters
Volume	97
Issue number	12
DOIs	https://doi.org/10.1063/1.3489689
State	Published - 20 Sep 2010
Externally published	Yes

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10.1063/1.3489689

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AU - Ozolins, Vidvuds

AU - Tu, King Ning

PY - 2010/9/20

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Erratum: Nanotwin formation in copper thin films by stress/strain relaxation in pulse electrodeposition (Applied Physics Letters (2007) 91 (254105))

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