TY - JOUR
T1 - Enhanced adhesion of PMMA to copper with black oxide for electrodeposition of high aspect ratio nickel-iron microstructures
AU - Kanigicherla, V. K.P.
AU - Kelly, K. W.
AU - Ma, E.
AU - Wang, W.
AU - Murphy, M. C.
PY - 1998/2
Y1 - 1998/2
N2 - Copper is widely used as a plating base for soft magnetic alloy electrodeposition in sensors and actuators. PMMA, the X-ray resist used in the LIGA process, typically has poor adhesion with copper. The use of black oxide of copper to enhance PMMA-copper adhesion was investigated. In this work, peel strength as a function of treatment time and the method of bonding was evaluated using an ASTM standard T-peel test. Peel strength increased with increasing treatment time. The feasibility of producing microstructures with predictable 3-D geometry for use in resonating sensors was investigated using the process developed. Nickel-iron structures of 100-1000 micrometers wide and 500 micrometers tall were successfully electrodeposited. Growth of other representative microstructures is being investigated.
AB - Copper is widely used as a plating base for soft magnetic alloy electrodeposition in sensors and actuators. PMMA, the X-ray resist used in the LIGA process, typically has poor adhesion with copper. The use of black oxide of copper to enhance PMMA-copper adhesion was investigated. In this work, peel strength as a function of treatment time and the method of bonding was evaluated using an ASTM standard T-peel test. Peel strength increased with increasing treatment time. The feasibility of producing microstructures with predictable 3-D geometry for use in resonating sensors was investigated using the process developed. Nickel-iron structures of 100-1000 micrometers wide and 500 micrometers tall were successfully electrodeposited. Growth of other representative microstructures is being investigated.
UR - https://www.scopus.com/pages/publications/0142172296
U2 - 10.1007/s005420050100
DO - 10.1007/s005420050100
M3 - 文章
AN - SCOPUS:0142172296
SN - 0946-7076
VL - 4
SP - 77
EP - 81
JO - Microsystem Technologies
JF - Microsystem Technologies
IS - 2
ER -