Skip to main navigation Skip to search Skip to main content

Electroless plating of copper through successive pretreatment with silane and colloidal silver

  • Zheng Chun Liu
  • , Quan Guo He
  • , Peng Hou
  • , Peng Feng Xiao
  • , Nong Yue He
  • , Zu Hong Lu
  • Hunan University of Technology
  • Southeast University, Nanjing

Research output: Contribution to journal › Article › peer-review

45 Scopus citations

Abstract

We report a method to perform electroless copper plating on glass that could generate a solid copper film. In this method, γ- mercaptopropyltrimethoxysilane (MPTS) was used to form self-assembled molecular layers on commercially available glass slides, which were subsequently activated by dipping them directly into colloidal Ag solution instead of conventional two-step method, SnCl2 sensitization followed by PdCl2 activation, and applied successfully for electroless Cu plating. Experimental characterizations showed that a thin layer of Ag colloids was anchored onto the glass surface through S - Ag bonds, resulting a quicker deposition of copper metal and a stronger adherence of copper film on MPTS-modified glass surface than those on conventional two-step modified glass.

Original languageEnglish
Pages (from-to)283-286
Number of pages4
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
Volume257-258
DOIs
StatePublished - 5 May 2005
Externally publishedYes

Keywords

  • Colloidal Ag
  • Electroless copper plating
  • Self-assembled molecular layer

Fingerprint

Dive into the research topics of 'Electroless plating of copper through successive pretreatment with silane and colloidal silver'. Together they form a unique fingerprint.

Cite this