Abstract
The developed electric-field-driven generative-nanoimprinting technology enables direct fabrication of large-area tilted metasurface nanostructures with cost-efficiency and high-throughput advantages. Real-time tuning of process parameters facilitates customized fabrication of various tilted metasurface nanostructures. Integration of these custom-designed high-angle-tilted nanostructures into augmented reality displays achieves superior image quality.
| Original language | English |
|---|---|
| Article number | 12 |
| Journal | Nano-Micro Letters |
| Volume | 18 |
| Issue number | 1 |
| DOIs | |
| State | Published - Dec 2026 |
Keywords
- Electric field assistance
- Generative nanoimprinting
- Large-area fabrication
- Tilted metasurface structures
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