Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

Yu Fan; Chunhui Wang; Jiaxing Sun; Xiaogang Peng; Hongmiao Tian; Xiangming Li; Xiaoliang Chen; Xiaoming Chen; Jinyou Shao

doi:10.1088/2631-7990/acd827

Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

Yu Fan
, Chunhui Wang
, Jiaxing Sun
, Xiaogang Peng
, Hongmiao Tian
, Xiangming Li
, Xiaoliang Chen
, Xiaoming Chen
, Jinyou Shao

School of Mechanical Engineering

Xi'an Jiaotong University

Research output: Contribution to journal › Article › peer-review

34 Scopus citations

Abstract

Highlights Electric-field flexible-roller nanoimprint lithography (EF-NIL) is proposed for nanopatterning. Large-scale nanopatterning is prepared on the stress-sensitive warped substrate. The high-fidelity structures with different varieties and aspect ratios can be fabricated.

Original language	English
Article number	035101
Journal	International Journal of Extreme Manufacturing
Volume	5
Issue number	3
DOIs	https://doi.org/10.1088/2631-7990/acd827
State	Published - Sep 2023

Keywords

electric-driven
flexible-roller
nanoimprinting
stress-sensitive
warped

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10.1088/2631-7990/acd827

Cite this

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title = "Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer",

abstract = "Highlights Electric-field flexible-roller nanoimprint lithography (EF-NIL) is proposed for nanopatterning. Large-scale nanopatterning is prepared on the stress-sensitive warped substrate. The high-fidelity structures with different varieties and aspect ratios can be fabricated.",

keywords = "electric-driven, flexible-roller, nanoimprinting, stress-sensitive, warped",

author = "Yu Fan and Chunhui Wang and Jiaxing Sun and Xiaogang Peng and Hongmiao Tian and Xiangming Li and Xiaoliang Chen and Xiaoming Chen and Jinyou Shao",

note = "Publisher Copyright: {\textcopyright} 2023 The Author(s). Published by IOP Publishing Ltd on behalf of the IMMT.",

year = "2023",

month = sep,

doi = "10.1088/2631-7990/acd827",

language = "英语",

volume = "5",

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T1 - Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

AU - Fan, Yu

AU - Wang, Chunhui

AU - Sun, Jiaxing

AU - Peng, Xiaogang

AU - Tian, Hongmiao

AU - Li, Xiangming

AU - Chen, Xiaoliang

AU - Chen, Xiaoming

AU - Shao, Jinyou

PY - 2023/9

Y1 - 2023/9

N2 - Highlights Electric-field flexible-roller nanoimprint lithography (EF-NIL) is proposed for nanopatterning. Large-scale nanopatterning is prepared on the stress-sensitive warped substrate. The high-fidelity structures with different varieties and aspect ratios can be fabricated.

AB - Highlights Electric-field flexible-roller nanoimprint lithography (EF-NIL) is proposed for nanopatterning. Large-scale nanopatterning is prepared on the stress-sensitive warped substrate. The high-fidelity structures with different varieties and aspect ratios can be fabricated.

KW - electric-driven

KW - flexible-roller

KW - nanoimprinting

KW - stress-sensitive

KW - warped

UR - https://www.scopus.com/pages/publications/85161710638

U2 - 10.1088/2631-7990/acd827

DO - 10.1088/2631-7990/acd827

M3 - 文章

AN - SCOPUS:85161710638

SN - 2631-8644

VL - 5

JO - International Journal of Extreme Manufacturing

JF - International Journal of Extreme Manufacturing

IS - 3

M1 - 035101

ER -

Electric-driven flexible-roller nanoimprint lithography on the stress-sensitive warped wafer

Abstract

Keywords

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