Effect of oxygen pressure on structure and properties of Bi                         1.5                         Zn                         1.0                         Nb                         1.5                         O                         7                          pyrochlore thin films prepared by pulsed laser deposition

Xiaohua Zhang; Wei Ren; Peng Shi; Xiaofeng Chen; Xiaoqing Wu

doi:10.1016/j.apsusc.2009.10.020

Effect of oxygen pressure on structure and properties of Bi _1.5 Zn _1.0 Nb _1.5 O ₇ pyrochlore thin films prepared by pulsed laser deposition

Xiaohua Zhang
, Wei Ren
, Peng Shi
, Xiaofeng Chen
, Xiaoqing Wu

Key Lab of the Ministry of Education for Process Control and Efficiency Egineering

Research output: Contribution to journal › Article › peer-review

31 Scopus citations

Abstract

The Bi ₂ O ₃ -ZnO-Nb ₂ O ₅ (BZN) cubic pyrochlore thin films were prepared on Pt/TiO ₂ /SiO ₂ /Si(1 0 0) substrates by using pulsed laser deposition process. The oxygen pressure was varied in the range of 5-50 Pa to investigate its effect on the structure and dielectric properties of BZN thin films. It is found that oxygen pressure during deposition plays an important role on structure and other properties of BZN films. The BZN films deposited at temperature of 650 °C and at O ₂ pressure of 5 Pa have an amorphous BZN and Nb ₂ O ₅ phases but exhibits a cubic pyrochlore structure with a preferential (2 2 2) orientation when the oxygen pressure increases to 10 Pa. Dielectric constant and loss tangent of the films deposited at 10 Pa are 185 and 0.0008 at 10 kHz, respectively. The dielectric tunability is about 10% at a dc bias field of 0.9 MV/cm.

Original language	English
Pages (from-to)	1861-1866
Number of pages	6
Journal	Applied Surface Science
Volume	256
Issue number	6
DOIs	https://doi.org/10.1016/j.apsusc.2009.10.020
State	Published - 1 Jan 2010
Externally published	Yes

Keywords

BZN thin films
Dielectric properties
Oxygen pressure
Pulsed laser deposition
Tunability

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10.1016/j.apsusc.2009.10.020

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Zhang, X., Ren, W., Shi, P., Chen, X., & Wu, X. (2010). Effect of oxygen pressure on structure and properties of Bi _1.5 Zn _1.0 Nb _1.5 O ₇ pyrochlore thin films prepared by pulsed laser deposition Applied Surface Science, 256(6), 1861-1866. https://doi.org/10.1016/j.apsusc.2009.10.020

Zhang, Xiaohua ; Ren, Wei ; Shi, Peng et al. / Effect of oxygen pressure on structure and properties of Bi _1.5 Zn _1.0 Nb _1.5 O ₇ pyrochlore thin films prepared by pulsed laser deposition In: Applied Surface Science. 2010 ; Vol. 256, No. 6. pp. 1861-1866.

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title = " Effect of oxygen pressure on structure and properties of Bi 1.5 Zn 1.0 Nb 1.5 O 7 pyrochlore thin films prepared by pulsed laser deposition ",

abstract = " The Bi 2 O 3 -ZnO-Nb 2 O 5 (BZN) cubic pyrochlore thin films were prepared on Pt/TiO 2 /SiO 2 /Si(1 0 0) substrates by using pulsed laser deposition process. The oxygen pressure was varied in the range of 5-50 Pa to investigate its effect on the structure and dielectric properties of BZN thin films. It is found that oxygen pressure during deposition plays an important role on structure and other properties of BZN films. The BZN films deposited at temperature of 650 °C and at O 2 pressure of 5 Pa have an amorphous BZN and Nb 2 O 5 phases but exhibits a cubic pyrochlore structure with a preferential (2 2 2) orientation when the oxygen pressure increases to 10 Pa. Dielectric constant and loss tangent of the films deposited at 10 Pa are 185 and 0.0008 at 10 kHz, respectively. The dielectric tunability is about 10\% at a dc bias field of 0.9 MV/cm.",

keywords = "BZN thin films, Dielectric properties, Oxygen pressure, Pulsed laser deposition, Tunability",

author = "Xiaohua Zhang and Wei Ren and Peng Shi and Xiaofeng Chen and Xiaoqing Wu",

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doi = "10.1016/j.apsusc.2009.10.020",

language = "英语",

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pages = "1861--1866",

journal = "Applied Surface Science",

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Zhang, X, Ren, W , Shi, P, Chen, X & Wu, X 2010, ' Effect of oxygen pressure on structure and properties of Bi _1.5 Zn _1.0 Nb _1.5 O ₇ pyrochlore thin films prepared by pulsed laser deposition ', Applied Surface Science, vol. 256, no. 6, pp. 1861-1866. https://doi.org/10.1016/j.apsusc.2009.10.020

Effect of oxygen pressure on structure and properties of Bi _1.5 Zn _1.0 Nb _1.5 O ₇ pyrochlore thin films prepared by pulsed laser deposition . / Zhang, Xiaohua; Ren, Wei ; Shi, Peng et al.
In: Applied Surface Science, Vol. 256, No. 6, 01.01.2010, p. 1861-1866.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Effect of oxygen pressure on structure and properties of Bi 1.5 Zn 1.0 Nb 1.5 O 7 pyrochlore thin films prepared by pulsed laser deposition

AU - Zhang, Xiaohua

AU - Ren, Wei

AU - Shi, Peng

AU - Chen, Xiaofeng

AU - Wu, Xiaoqing

PY - 2010/1/1

Y1 - 2010/1/1

N2 - The Bi 2 O 3 -ZnO-Nb 2 O 5 (BZN) cubic pyrochlore thin films were prepared on Pt/TiO 2 /SiO 2 /Si(1 0 0) substrates by using pulsed laser deposition process. The oxygen pressure was varied in the range of 5-50 Pa to investigate its effect on the structure and dielectric properties of BZN thin films. It is found that oxygen pressure during deposition plays an important role on structure and other properties of BZN films. The BZN films deposited at temperature of 650 °C and at O 2 pressure of 5 Pa have an amorphous BZN and Nb 2 O 5 phases but exhibits a cubic pyrochlore structure with a preferential (2 2 2) orientation when the oxygen pressure increases to 10 Pa. Dielectric constant and loss tangent of the films deposited at 10 Pa are 185 and 0.0008 at 10 kHz, respectively. The dielectric tunability is about 10% at a dc bias field of 0.9 MV/cm.

AB - The Bi 2 O 3 -ZnO-Nb 2 O 5 (BZN) cubic pyrochlore thin films were prepared on Pt/TiO 2 /SiO 2 /Si(1 0 0) substrates by using pulsed laser deposition process. The oxygen pressure was varied in the range of 5-50 Pa to investigate its effect on the structure and dielectric properties of BZN thin films. It is found that oxygen pressure during deposition plays an important role on structure and other properties of BZN films. The BZN films deposited at temperature of 650 °C and at O 2 pressure of 5 Pa have an amorphous BZN and Nb 2 O 5 phases but exhibits a cubic pyrochlore structure with a preferential (2 2 2) orientation when the oxygen pressure increases to 10 Pa. Dielectric constant and loss tangent of the films deposited at 10 Pa are 185 and 0.0008 at 10 kHz, respectively. The dielectric tunability is about 10% at a dc bias field of 0.9 MV/cm.

KW - BZN thin films

KW - Dielectric properties

KW - Oxygen pressure

KW - Pulsed laser deposition

KW - Tunability

UR - https://www.scopus.com/pages/publications/72549108752

U2 - 10.1016/j.apsusc.2009.10.020

DO - 10.1016/j.apsusc.2009.10.020

M3 - 文章

AN - SCOPUS:72549108752

SN - 0169-4332

VL - 256

SP - 1861

EP - 1866

JO - Applied Surface Science

JF - Applied Surface Science

IS - 6

ER -

Zhang X, Ren W , Shi P, Chen X, Wu X. Effect of oxygen pressure on structure and properties of Bi _1.5 Zn _1.0 Nb _1.5 O ₇ pyrochlore thin films prepared by pulsed laser deposition Applied Surface Science. 2010 Jan 1;256(6):1861-1866. doi: 10.1016/j.apsusc.2009.10.020

Effect of oxygen pressure on structure and properties of Bi _1.5 Zn _1.0 Nb _1.5 O ₇ pyrochlore thin films prepared by pulsed laser deposition

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Keywords

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