Effect of N2 partial pressure on the microstructure and properties of Nb-Si-N films

Jianfeng Wang; Zhongxiao Song; Kewei Xu; Duowang Fan

Effect of N₂ partial pressure on the microstructure and properties of Nb-Si-N films

Jianfeng Wang
, Zhongxiao Song
, Kewei Xu
, Duowang Fan

School of Materials Science and Engineering

Xi'an Jiaotong University
Lanzhou Jiaotong University

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

The Nb-Si-N films were deposited by reactive magnetron sputtering with different N₂ partial pressures. The result showed that the composition, microstructure and properties of the Nb-Si-N films depend strongly on the N₂ partial pressure. As the N₂ partial pressure increasing, the Nb/Si ratio and the surface roughness decease, but the bulk resistance and microhardness of the Nb-Si-N films increase. The microstructure of Nb-Si-N films is a nano-composite structure consisting of nano-sized NbN crystallites and amorphous Si₃N₄-like compound of Si-N. With the increase of N₂ partial pressure, the amorphous tendency of Nb-Si-N films increases and the grain size decreases.

Original language	English
Pages (from-to)	978-981
Number of pages	4
Journal	Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume	35
Issue number	6
State	Published - Jun 2006

Keywords

Magnetron sputtering
Microstructure
N partial pressure
Nb-Si-N

Cite this

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title = "Effect of N2 partial pressure on the microstructure and properties of Nb-Si-N films",

abstract = "The Nb-Si-N films were deposited by reactive magnetron sputtering with different N2 partial pressures. The result showed that the composition, microstructure and properties of the Nb-Si-N films depend strongly on the N2 partial pressure. As the N2 partial pressure increasing, the Nb/Si ratio and the surface roughness decease, but the bulk resistance and microhardness of the Nb-Si-N films increase. The microstructure of Nb-Si-N films is a nano-composite structure consisting of nano-sized NbN crystallites and amorphous Si3N4-like compound of Si-N. With the increase of N2 partial pressure, the amorphous tendency of Nb-Si-N films increases and the grain size decreases.",

keywords = "Magnetron sputtering, Microstructure, N partial pressure, Nb-Si-N",

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TY - JOUR

T1 - Effect of N2 partial pressure on the microstructure and properties of Nb-Si-N films

AU - Wang, Jianfeng

AU - Song, Zhongxiao

AU - Xu, Kewei

AU - Fan, Duowang

PY - 2006/6

Y1 - 2006/6

N2 - The Nb-Si-N films were deposited by reactive magnetron sputtering with different N2 partial pressures. The result showed that the composition, microstructure and properties of the Nb-Si-N films depend strongly on the N2 partial pressure. As the N2 partial pressure increasing, the Nb/Si ratio and the surface roughness decease, but the bulk resistance and microhardness of the Nb-Si-N films increase. The microstructure of Nb-Si-N films is a nano-composite structure consisting of nano-sized NbN crystallites and amorphous Si3N4-like compound of Si-N. With the increase of N2 partial pressure, the amorphous tendency of Nb-Si-N films increases and the grain size decreases.

AB - The Nb-Si-N films were deposited by reactive magnetron sputtering with different N2 partial pressures. The result showed that the composition, microstructure and properties of the Nb-Si-N films depend strongly on the N2 partial pressure. As the N2 partial pressure increasing, the Nb/Si ratio and the surface roughness decease, but the bulk resistance and microhardness of the Nb-Si-N films increase. The microstructure of Nb-Si-N films is a nano-composite structure consisting of nano-sized NbN crystallites and amorphous Si3N4-like compound of Si-N. With the increase of N2 partial pressure, the amorphous tendency of Nb-Si-N films increases and the grain size decreases.

KW - Magnetron sputtering

KW - Microstructure

KW - N partial pressure

KW - Nb-Si-N

UR - https://www.scopus.com/pages/publications/33746479285

M3 - 文章

AN - SCOPUS:33746479285

SN - 1002-185X

VL - 35

SP - 978

EP - 981

JO - Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering

JF - Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering

IS - 6

ER -

Effect of N₂ partial pressure on the microstructure and properties of Nb-Si-N films

Abstract

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