Dual-Site Doping and Low-Angle Grain Boundaries Lead to High Thermoelectric Performance in N-Type Bi2S3

  • Jian Yang
  • , Haolin Ye
  • , Xiangzhao Zhang
  • , Xin Miao
  • , Xiubo Yang
  • , Lin Xie
  • , Zhongqi Shi
  • , Shaoping Chen
  • , Chongjian Zhou
  • , Guanjun Qiao
  • , Matthias Wuttig
  • , Li Wang
  • , Guiwu Liu
  • , Yuan Yu

Research output: Contribution to journalArticlepeer-review

43 Scopus citations

Abstract

Bismuth sulfide (Bi2S3) is a promising thermoelectric material with earth-abundant, low-cost, and environment-friendly constituents. However, it shows poor thermoelectric performance due to its extremely low electrical conductivity derived from the low electron concentration. Here, a high-performance Bi2S3-based material is reported to benefit from the Fermi level tuning by Ag and Cl co-doping and defect engineering by introducing dense low-angle grain boundaries. Both Ag and Cl act as donors in Bi2S3, upshifting the Fermi level. This increases the electron concentration without degrading the electron mobility, thereby obtaining improved electrical conductivity. The electron localization function (ELF) contour map indicates that interstitial Ag causes electron delocalization, showing higher electron mobility in Bi2S3. More importantly, dense low-angle grain boundaries block phonon propagation, yielding an ultralow lattice thermal conductivity of 0.30 W m−1 K−1. Consequently, a record ZT value of ≈0.9 at 676 K is achieved in the Bi2Ag0.01S3-0.5%BiCl3 sample.

Original languageEnglish
Article number2306961
JournalAdvanced Functional Materials
Volume34
Issue number11
DOIs
StatePublished - 11 Mar 2024

Keywords

  • bismuth sulfide
  • dual-site doping
  • electron delocalization
  • low-angle grain boundary
  • thermoelectric

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