Double Mask Projection Stereolithography Equipment

The existing digital imaging chip used in mask projection stereolithography system cannot balance the requirements for part size and precision, so a novel stereolithography method based on DMD with two mask projection systems is proposed in this study and the corresponding equipment is constructed. According to DMD digital imaging chip, a scheme of double mask projection sterolithography system is suggested, and the optical system and the machine structure are designed. The uniformity of illumination intensity of 4X image, the distortion correction of 4X image, the demolding program and the curing parts of single row pixel projection of 4X lens and 0.5X lens are measured and tested. The double mask projection sterolithography method is experimentally verified for the process feasibility. The results demonstrate that the average widths of cured parts of the single row pixel of two projection images reach 55 μm and 8 μm, and the proposed method can balance the requirements for both size and precision in macro/micro structure manufacturing.