Distribution of cathode spots in vacuum arc under nonuniform axial magnetic fields

Zongqian Shi; Shenli Jia; Lijun Wang; Xingwen Li; Zheng Wang

doi:10.1088/1009-0630/9/6/05

Distribution of cathode spots in vacuum arc under nonuniform axial magnetic fields

Zongqian Shi
, Shenli Jia
, Lijun Wang
, Xingwen Li
, Zheng Wang

School of Electrical Engineering

Xi'an Jiaotong University

Research output: Contribution to journal › Article › peer-review

Abstract

Recent results on the distribution of vacuum arc cathode spots (CSs) in nonuniform axial magnetic field (AMF) are presented. Based on previous studies, we deem that two contrary influences of AMF, inward effect and outward effect, are attributed to CSs distribution. With this notion, we have analyzed the controlling effectiveness of nonuniform AMF on CSs distribution. Experiments were conducted in a detachable vacuum chamber with iron-style AMF electrodes. Images of vacuum arc column and the distribution of CSs were photographed with a high-speed charge coupled device (CCD) camera. Experimental results agreed well with the theoretical analysis.

Original language	English
Pages (from-to)	666-669
Number of pages	4
Journal	Plasma Science and Technology
Volume	9
Issue number	6
DOIs	https://doi.org/10.1088/1009-0630/9/6/05
State	Published - 1 Dec 2007

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title = "Distribution of cathode spots in vacuum arc under nonuniform axial magnetic fields",

abstract = "Recent results on the distribution of vacuum arc cathode spots (CSs) in nonuniform axial magnetic field (AMF) are presented. Based on previous studies, we deem that two contrary influences of AMF, inward effect and outward effect, are attributed to CSs distribution. With this notion, we have analyzed the controlling effectiveness of nonuniform AMF on CSs distribution. Experiments were conducted in a detachable vacuum chamber with iron-style AMF electrodes. Images of vacuum arc column and the distribution of CSs were photographed with a high-speed charge coupled device (CCD) camera. Experimental results agreed well with the theoretical analysis.",

author = "Zongqian Shi and Shenli Jia and Lijun Wang and Xingwen Li and Zheng Wang",

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T1 - Distribution of cathode spots in vacuum arc under nonuniform axial magnetic fields

AU - Shi, Zongqian

AU - Jia, Shenli

AU - Wang, Lijun

AU - Li, Xingwen

AU - Wang, Zheng

PY - 2007/12/1

Y1 - 2007/12/1

N2 - Recent results on the distribution of vacuum arc cathode spots (CSs) in nonuniform axial magnetic field (AMF) are presented. Based on previous studies, we deem that two contrary influences of AMF, inward effect and outward effect, are attributed to CSs distribution. With this notion, we have analyzed the controlling effectiveness of nonuniform AMF on CSs distribution. Experiments were conducted in a detachable vacuum chamber with iron-style AMF electrodes. Images of vacuum arc column and the distribution of CSs were photographed with a high-speed charge coupled device (CCD) camera. Experimental results agreed well with the theoretical analysis.

AB - Recent results on the distribution of vacuum arc cathode spots (CSs) in nonuniform axial magnetic field (AMF) are presented. Based on previous studies, we deem that two contrary influences of AMF, inward effect and outward effect, are attributed to CSs distribution. With this notion, we have analyzed the controlling effectiveness of nonuniform AMF on CSs distribution. Experiments were conducted in a detachable vacuum chamber with iron-style AMF electrodes. Images of vacuum arc column and the distribution of CSs were photographed with a high-speed charge coupled device (CCD) camera. Experimental results agreed well with the theoretical analysis.

UR - https://www.scopus.com/pages/publications/38049073242

U2 - 10.1088/1009-0630/9/6/05

DO - 10.1088/1009-0630/9/6/05

M3 - 文章

AN - SCOPUS:38049073242

SN - 1009-0630

VL - 9

SP - 666

EP - 669

JO - Plasma Science and Technology

JF - Plasma Science and Technology

IS - 6

ER -

Distribution of cathode spots in vacuum arc under nonuniform axial magnetic fields

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