Diffraction grating microfabrication by ICP technique with two-layer lift-off processing in single crystal diamond

  • Yuhang Zhao
  • , Zhiqiang Song
  • , Yan Liang
  • , Tianfei Zhu
  • , Shenli Jia
  • , Hong Xing Wang
  • , Shuwei Fan

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The rectangular diffraction grating on single crystal diamond was fabricated with the wavelength of 10.6μm. A novel method called bi-layer lift-off technology was used to form the hard mask. This approach simplified the patterning process of the thick Al film and made the deep etching on single crystal diamond achievable according to our requirement. The fabrication steps and the bi-layer liftoff technology are demonstrated in detail. We characterized the diamond grating and found that the angles of its sidewalls were almost vertical (within 3°), with a mean roughness of Ra = 3.01nm on the bottom and 12.4nm on the top.

Original languageEnglish
Title of host publicationComponents and Packaging for Laser Systems X
EditorsAlexei L. Glebov, Paul O. Leisher
PublisherSPIE
ISBN (Electronic)9781510669918
DOIs
StatePublished - 2024
EventComponents and Packaging for Laser Systems X 2024 - San Francisco, United States
Duration: 29 Jan 202430 Jan 2024

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume12866
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceComponents and Packaging for Laser Systems X 2024
Country/TerritoryUnited States
CitySan Francisco
Period29/01/2430/01/24

Keywords

  • Bi-layer lift-off
  • Diffraction grating
  • Inductive coupled plasma etching
  • Single crystal diamond

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