TY - JOUR
T1 - Development of leadless packaged heavily doped N-type 4H-SiC pressure sensor family for harsh environments
AU - Wang, Lukang
AU - Wan, Nuo
AU - Yang, Yu
AU - Wang, Yabing
AU - Zhao, You
AU - Zhu, Jiaoyang
AU - Yang, Minye
AU - Lyu, Yi
AU - Liu, Ming
AU - Zhao, Yulong
N1 - Publisher Copyright:
© The Author(s) 2025.
PY - 2025/12
Y1 - 2025/12
N2 - In many industries, there is a growing demand for semiconductor pressure sensors capable of operating in harsh environments with extremely high and low temperatures and high vibrations. Utilizing the piezoresistive effect of heavily doped N-type 4H-SiC, we proposed a family design of eight pressure sensor chip structures featuring different diaphragm shapes of circles and squares, along with different piezoresistor configurations. The 4H-SiC piezoresistive pressure sensor was developed using micro-electromechanical systems (MEMS) technology and encapsulated in a leadless package structure via low-stress connection achieved by glass frit sintering. The 4H-SiC pressure sensor demonstrates impressive performance, exhibiting an accuracy of 0.18% FSO and a temperature tolerance range from −50 to 600 °C, with a temperature coefficient of zero output as low as 0.08%/°C at 600 °C. Furthermore, the developed sensor shows remarkable stability under conditions of high-temperature vibration coupling. The advancement of this family of 4H-SiC pressure sensors provides a promising solution for pressure measurement in harsh industrial environments.
AB - In many industries, there is a growing demand for semiconductor pressure sensors capable of operating in harsh environments with extremely high and low temperatures and high vibrations. Utilizing the piezoresistive effect of heavily doped N-type 4H-SiC, we proposed a family design of eight pressure sensor chip structures featuring different diaphragm shapes of circles and squares, along with different piezoresistor configurations. The 4H-SiC piezoresistive pressure sensor was developed using micro-electromechanical systems (MEMS) technology and encapsulated in a leadless package structure via low-stress connection achieved by glass frit sintering. The 4H-SiC pressure sensor demonstrates impressive performance, exhibiting an accuracy of 0.18% FSO and a temperature tolerance range from −50 to 600 °C, with a temperature coefficient of zero output as low as 0.08%/°C at 600 °C. Furthermore, the developed sensor shows remarkable stability under conditions of high-temperature vibration coupling. The advancement of this family of 4H-SiC pressure sensors provides a promising solution for pressure measurement in harsh industrial environments.
UR - https://www.scopus.com/pages/publications/105003797574
U2 - 10.1038/s41378-025-00929-z
DO - 10.1038/s41378-025-00929-z
M3 - 文章
AN - SCOPUS:105003797574
SN - 2055-7434
VL - 11
JO - Microsystems and Nanoengineering
JF - Microsystems and Nanoengineering
IS - 1
M1 - 74
ER -