Design and fabrication of a MEMS X-ray optic using anisotrospic wet eetching of Si Wafers

M. Koshiishi; Y. Ezoe; M. Mita; K. Mitsuda; T. Takano; R. Maeda; Y. Ishisaki

Design and fabrication of a MEMS X-ray optic using anisotrospic wet eetching of Si Wafers

M. Koshiishi
, Y. Ezoe
, M. Mita
, K. Mitsuda
, T. Takano
, R. Maeda
, Y. Ishisaki

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

4 Scopus citations

Abstract

We report on our development of X-ray optics using anisotropic wet etching of ssilicon wafers. Both X-ray mirrors and an optics mount are fabricated fully using the MEMS technologies.

Original language	English
Title of host publication	IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006
Pages	84-85
Number of pages	2
State	Published - 2006
Externally published	Yes
Event	IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006 - Big Sky, MT, United States Duration: 21 Aug 2006 → 24 Aug 2006

Publication series

Name	IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006

Conference

Conference	IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006
Country/Territory	United States
City	Big Sky, MT
Period	21/08/06 → 24/08/06

Cite this

Koshiishi, M., Ezoe, Y., Mita, M., Mitsuda, K., Takano, T., Maeda, R., & Ishisaki, Y. (2006). Design and fabrication of a MEMS X-ray optic using anisotrospic wet eetching of Si Wafers. In IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006 (pp. 84-85). Article 1708276 (IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006).

@inproceedings{346207cf9a03471ba0ebb7bd8cea9411,

title = "Design and fabrication of a MEMS X-ray optic using anisotrospic wet eetching of Si Wafers",

abstract = "We report on our development of X-ray optics using anisotropic wet etching of ssilicon wafers. Both X-ray mirrors and an optics mount are fabricated fully using the MEMS technologies.",

author = "M. Koshiishi and Y. Ezoe and M. Mita and K. Mitsuda and T. Takano and R. Maeda and Y. Ishisaki",

year = "2006",

language = "英语",

isbn = "078039562X",

series = "IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006",

pages = "84--85",

booktitle = "IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006",

note = "IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006 ; Conference date: 21-08-2006 Through 24-08-2006",

}

Koshiishi, M, Ezoe, Y, Mita, M, Mitsuda, K, Takano, T, Maeda, R & Ishisaki, Y 2006, Design and fabrication of a MEMS X-ray optic using anisotrospic wet eetching of Si Wafers. in IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006., 1708276, IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006, pp. 84-85, IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006, Big Sky, MT, United States, 21/08/06.

Design and fabrication of a MEMS X-ray optic using anisotrospic wet eetching of Si Wafers. / Koshiishi, M.; Ezoe, Y.; Mita, M. et al.
IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006. 2006. p. 84-85 1708276 (IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Design and fabrication of a MEMS X-ray optic using anisotrospic wet eetching of Si Wafers

AU - Koshiishi, M.

AU - Ezoe, Y.

AU - Mita, M.

AU - Mitsuda, K.

AU - Takano, T.

AU - Maeda, R.

AU - Ishisaki, Y.

PY - 2006

Y1 - 2006

N2 - We report on our development of X-ray optics using anisotropic wet etching of ssilicon wafers. Both X-ray mirrors and an optics mount are fabricated fully using the MEMS technologies.

AB - We report on our development of X-ray optics using anisotropic wet etching of ssilicon wafers. Both X-ray mirrors and an optics mount are fabricated fully using the MEMS technologies.

UR - https://www.scopus.com/pages/publications/41549156105

M3 - 会议稿件

AN - SCOPUS:41549156105

SN - 078039562X

SN - 9780780395626

T3 - IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006

SP - 84

EP - 85

BT - IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006

T2 - IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006

Y2 - 21 August 2006 through 24 August 2006

ER -

Design and fabrication of a MEMS X-ray optic using anisotrospic wet eetching of Si Wafers

Abstract

Publication series

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