TY - JOUR
T1 - Deposits removal and hydrogen release on co-deposited films exposed to O-ICR and O-GDC plasmas in HT-7
AU - Hu, J. S.
AU - Li, J. G.
AU - Ashikawa, N.
AU - Tokunaga, K.
AU - Noda, N.
AU - Yoshida, N.
PY - 2007/4/1
Y1 - 2007/4/1
N2 - A few new results of oxidation wall conditionings for deposits removal and hydrogen release were directly obtained on exposure of co-deposited films to O-ICR or O-GDC plasmas in HT-7. After the O-ICR or O-GDC treatments, the deposits were partially removed and deuterium retention was reduced. D 2 release from samples was reduced by a factor of 2-3, and the ratio of D/C decreased whereas that of O/C increased. The removal rates of C in various oxidation wall conditionings were about 1018-1019C m-2 min-1, which approached the estimated carbon deposited rates, of about 5.2 × 1018C m-2 min -1, on the tested samples. The He/O-ICR was more effective on the deposits removal and hydrogen (deuterium) release than O-GDC. And O-ICR was more effective on the surface facing main plasma than on that facing SOL plasma, whereas O-GDC possibly has uniform effectivity on both tested surfaces.
AB - A few new results of oxidation wall conditionings for deposits removal and hydrogen release were directly obtained on exposure of co-deposited films to O-ICR or O-GDC plasmas in HT-7. After the O-ICR or O-GDC treatments, the deposits were partially removed and deuterium retention was reduced. D 2 release from samples was reduced by a factor of 2-3, and the ratio of D/C decreased whereas that of O/C increased. The removal rates of C in various oxidation wall conditionings were about 1018-1019C m-2 min-1, which approached the estimated carbon deposited rates, of about 5.2 × 1018C m-2 min -1, on the tested samples. The He/O-ICR was more effective on the deposits removal and hydrogen (deuterium) release than O-GDC. And O-ICR was more effective on the surface facing main plasma than on that facing SOL plasma, whereas O-GDC possibly has uniform effectivity on both tested surfaces.
UR - https://www.scopus.com/pages/publications/34247187469
U2 - 10.1088/0741-3335/49/4/006
DO - 10.1088/0741-3335/49/4/006
M3 - 文章
AN - SCOPUS:34247187469
SN - 0741-3335
VL - 49
SP - 421
EP - 434
JO - Plasma Physics and Controlled Fusion
JF - Plasma Physics and Controlled Fusion
IS - 4
M1 - 006
ER -