Deposition of PZT thin films by excimer laser ablation deposition

Deposition of PZT with UV laser ablation was applied for realization of thin film sensors and actuators. Deposition rate of more than 3 micron/hour was attained by pulsed KrF excimer laser deposition, which is fairly better than those obtained by the other. Perovskite phase was obtained at room temperature deposition with Fast Atom Beam (FAB) treatment and annealing. Smart MEMS (Micro electro-mechanical system) is now a subject of interest in the field of micro optical device, micro pump, AFM cantilever devices etc. It can be fabricated by deposition of PZT thin films and micromachining. PZT film of more than 1 micron thickness is difficult to obtain by conventional methods. This is the reason why we applied excimer laser ablation for thin film deposition. Effects of deposition parameters such as LASER wave length, power density and radiation conditions were investigated on deposition rate and film properties. Effect of annealing was also investigated with XRD analysis. Relative dielectric constant is measured for thin films, and the micromachined cantilever beams were fabricated for measuring the deflection of the beams.