Cu/Ti纳米薄膜表面形貌的分形表征研究

Qi Jing Lin; Hao Wu; Fu Zheng Zhang; Chen Ying Wang; Zhuang De Jiang

doi:10.3969/j.issn.1000-1158.2018.05.01

Cu/Ti纳米薄膜表面形貌的分形表征研究

Translated title of the contribution: Research on Fractal Characterization of the Surface Morphology of Cu/Ti Nano Thin Film

Qi Jing Lin
, Hao Wu
, Fu Zheng Zhang
, Chen Ying Wang
, Zhuang De Jiang

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

Different composition and thickness of Cu/Ti films are fabricated by magnetron sputtering technology and their surface morphology are measured using atomic force microscope (AFM). The method of power spectrum is used to characterize the fractal morphology of the AFM height images. The results show that the Cu/Ti film surface morphology has multi-scale behavior and surface evolution in the whole and local area presents different scaling behavior. The high frequency section of the power spectrum for AFM image directly reflects the detail information of the surface while low frequency section reflects the complexity of the background region. There is an inevitable correlation between low frequency fractal dimension and roughness, because the change of low frequency fractal dimension can reflect the change trend of rough value R_a.

Translated title of the contribution	Research on Fractal Characterization of the Surface Morphology of Cu/Ti Nano Thin Film
Original language	Chinese (Traditional)
Pages (from-to)	593-597
Number of pages	5
Journal	Jiliang Xuebao/Acta Metrologica Sinica
Volume	39
Issue number	5
DOIs	https://doi.org/10.3969/j.issn.1000-1158.2018.05.01
State	Published - 22 Sep 2018

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title = "Cu/Ti纳米薄膜表面形貌的分形表征研究",

abstract = "Different composition and thickness of Cu/Ti films are fabricated by magnetron sputtering technology and their surface morphology are measured using atomic force microscope (AFM). The method of power spectrum is used to characterize the fractal morphology of the AFM height images. The results show that the Cu/Ti film surface morphology has multi-scale behavior and surface evolution in the whole and local area presents different scaling behavior. The high frequency section of the power spectrum for AFM image directly reflects the detail information of the surface while low frequency section reflects the complexity of the background region. There is an inevitable correlation between low frequency fractal dimension and roughness, because the change of low frequency fractal dimension can reflect the change trend of rough value Ra.",

keywords = "Fractal characterization, Metrology, Nano thin film, Power spectrum, Surface morphology",

author = "Lin, \{Qi Jing\} and Hao Wu and Zhang, \{Fu Zheng\} and Wang, \{Chen Ying\} and Jiang, \{Zhuang De\}",

year = "2018",

month = sep,

day = "22",

doi = "10.3969/j.issn.1000-1158.2018.05.01",

language = "繁体中文",

volume = "39",

pages = "593--597",

journal = "Jiliang Xuebao/Acta Metrologica Sinica",

issn = "1000-1158",

publisher = "Chinese Society for Measurement",

number = "5",

}

TY - JOUR

T1 - Cu/Ti纳米薄膜表面形貌的分形表征研究

AU - Lin, Qi Jing

AU - Wu, Hao

AU - Zhang, Fu Zheng

AU - Wang, Chen Ying

AU - Jiang, Zhuang De

PY - 2018/9/22

Y1 - 2018/9/22

N2 - Different composition and thickness of Cu/Ti films are fabricated by magnetron sputtering technology and their surface morphology are measured using atomic force microscope (AFM). The method of power spectrum is used to characterize the fractal morphology of the AFM height images. The results show that the Cu/Ti film surface morphology has multi-scale behavior and surface evolution in the whole and local area presents different scaling behavior. The high frequency section of the power spectrum for AFM image directly reflects the detail information of the surface while low frequency section reflects the complexity of the background region. There is an inevitable correlation between low frequency fractal dimension and roughness, because the change of low frequency fractal dimension can reflect the change trend of rough value Ra.

AB - Different composition and thickness of Cu/Ti films are fabricated by magnetron sputtering technology and their surface morphology are measured using atomic force microscope (AFM). The method of power spectrum is used to characterize the fractal morphology of the AFM height images. The results show that the Cu/Ti film surface morphology has multi-scale behavior and surface evolution in the whole and local area presents different scaling behavior. The high frequency section of the power spectrum for AFM image directly reflects the detail information of the surface while low frequency section reflects the complexity of the background region. There is an inevitable correlation between low frequency fractal dimension and roughness, because the change of low frequency fractal dimension can reflect the change trend of rough value Ra.

KW - Fractal characterization

KW - Metrology

KW - Nano thin film

KW - Power spectrum

KW - Surface morphology

UR - https://www.scopus.com/pages/publications/85058614052

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DO - 10.3969/j.issn.1000-1158.2018.05.01

M3 - 文章

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SN - 1000-1158

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JO - Jiliang Xuebao/Acta Metrologica Sinica

JF - Jiliang Xuebao/Acta Metrologica Sinica

IS - 5

ER -

Cu/Ti纳米薄膜表面形貌的分形表征研究

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