Coating of SiC with Ti by chemical vapour deposition

A. Umezawa; M. Yamaguchi; Y. Murakoshi; R. Maeda; T. Sano; M. Hirohashi

doi:10.1179/sur.1997.13.3.243

Coating of SiC with Ti by chemical vapour deposition

A. Umezawa
, M. Yamaguchi
, Y. Murakoshi
, R. Maeda
, T. Sano
, M. Hirohashi

Research output: Contribution to journal › Article › peer-review

Abstract

Silicon carbide particle reinforced aluminium alloy composites have been studied. One of the most important problems with metal matrix composites is low interfacial bonding strength between reinforcement and matrix, which results in poor mechanical properties. This work studied the coating method with the aim of improving interfacial bonding between SiC particles and Al alloy. Titanium coated SiC plates and particles were prepared by plasma enhanced chemical vapour deposition (PECVD) using the reactant system TiCl₄-H₂. Continuous and adherent films on the SiC plates and particles were obtained by PECVD treatment for 2 min. Treatment by PECVD for periods greater than 2 min resulted in crack formation and agglomeration of particles. Chlorine content in the films was reduced by using laser CVD as compared with PECVD.

Original language	English
Pages (from-to)	243-246
Number of pages	4
Journal	Surface Engineering
Volume	13
Issue number	3
DOIs	https://doi.org/10.1179/sur.1997.13.3.243
State	Published - 1997
Externally published	Yes

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title = "Coating of SiC with Ti by chemical vapour deposition",

abstract = "Silicon carbide particle reinforced aluminium alloy composites have been studied. One of the most important problems with metal matrix composites is low interfacial bonding strength between reinforcement and matrix, which results in poor mechanical properties. This work studied the coating method with the aim of improving interfacial bonding between SiC particles and Al alloy. Titanium coated SiC plates and particles were prepared by plasma enhanced chemical vapour deposition (PECVD) using the reactant system TiCl4-H2. Continuous and adherent films on the SiC plates and particles were obtained by PECVD treatment for 2 min. Treatment by PECVD for periods greater than 2 min resulted in crack formation and agglomeration of particles. Chlorine content in the films was reduced by using laser CVD as compared with PECVD.",

author = "A. Umezawa and M. Yamaguchi and Y. Murakoshi and R. Maeda and T. Sano and M. Hirohashi",

year = "1997",

doi = "10.1179/sur.1997.13.3.243",

language = "英语",

volume = "13",

pages = "243--246",

journal = "Surface Engineering",

issn = "0267-0844",

publisher = "SAGE Publications Ltd",

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}

TY - JOUR

T1 - Coating of SiC with Ti by chemical vapour deposition

AU - Umezawa, A.

AU - Yamaguchi, M.

AU - Murakoshi, Y.

AU - Maeda, R.

AU - Sano, T.

AU - Hirohashi, M.

PY - 1997

Y1 - 1997

N2 - Silicon carbide particle reinforced aluminium alloy composites have been studied. One of the most important problems with metal matrix composites is low interfacial bonding strength between reinforcement and matrix, which results in poor mechanical properties. This work studied the coating method with the aim of improving interfacial bonding between SiC particles and Al alloy. Titanium coated SiC plates and particles were prepared by plasma enhanced chemical vapour deposition (PECVD) using the reactant system TiCl4-H2. Continuous and adherent films on the SiC plates and particles were obtained by PECVD treatment for 2 min. Treatment by PECVD for periods greater than 2 min resulted in crack formation and agglomeration of particles. Chlorine content in the films was reduced by using laser CVD as compared with PECVD.

AB - Silicon carbide particle reinforced aluminium alloy composites have been studied. One of the most important problems with metal matrix composites is low interfacial bonding strength between reinforcement and matrix, which results in poor mechanical properties. This work studied the coating method with the aim of improving interfacial bonding between SiC particles and Al alloy. Titanium coated SiC plates and particles were prepared by plasma enhanced chemical vapour deposition (PECVD) using the reactant system TiCl4-H2. Continuous and adherent films on the SiC plates and particles were obtained by PECVD treatment for 2 min. Treatment by PECVD for periods greater than 2 min resulted in crack formation and agglomeration of particles. Chlorine content in the films was reduced by using laser CVD as compared with PECVD.

UR - https://www.scopus.com/pages/publications/0030658472

U2 - 10.1179/sur.1997.13.3.243

DO - 10.1179/sur.1997.13.3.243

M3 - 文章

AN - SCOPUS:0030658472

SN - 0267-0844

VL - 13

SP - 243

EP - 246

JO - Surface Engineering

JF - Surface Engineering

IS - 3

ER -

Coating of SiC with Ti by chemical vapour deposition

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