TY - JOUR
T1 - Charge effect in secondary electron emission from silicon surface induced by slow neon ions
AU - Xu, Zhongfeng
AU - Zeng, Lixia
AU - Zhao, Yongtao
AU - Wang, Jianguo
AU - Wang, Yuyu
AU - Zhang, Xiaoan
AU - Xiao, Guoqing
AU - Li, Fuli
PY - 2012/6
Y1 - 2012/6
N2 - Total electron emission yield for impact of slow Ne q+(q = 2, 4, 6, 8) ions with various kinetic energy under normal incidence on n-type Si has been measured. It is shown that for the same charge state, the total electron yield Y increases linearly as the kinetic energy of projectile at impact increases, up to velocities corresponding to the "classical" threshold. Separation of kinetic electron yield γKE and potential electron yield γPE shows that γPE is proportional to the ion charge state and γKE increases linearly with projectile velocity. Finally, based on "single hole without hopping" hypothesis, the expression of the "CRF" F(q) is given, and the relation between γKE and q is obtained successfully for the first time, which is also a basis for judging whether the "trampoline effect" exists.
AB - Total electron emission yield for impact of slow Ne q+(q = 2, 4, 6, 8) ions with various kinetic energy under normal incidence on n-type Si has been measured. It is shown that for the same charge state, the total electron yield Y increases linearly as the kinetic energy of projectile at impact increases, up to velocities corresponding to the "classical" threshold. Separation of kinetic electron yield γKE and potential electron yield γPE shows that γPE is proportional to the ion charge state and γKE increases linearly with projectile velocity. Finally, based on "single hole without hopping" hypothesis, the expression of the "CRF" F(q) is given, and the relation between γKE and q is obtained successfully for the first time, which is also a basis for judging whether the "trampoline effect" exists.
KW - Charge restrain factor
KW - Electron emission yield
KW - Highly charged ions (HCI)
KW - Threshold velocity
UR - https://www.scopus.com/pages/publications/84862284251
U2 - 10.1017/S0263034612000171
DO - 10.1017/S0263034612000171
M3 - 文章
AN - SCOPUS:84862284251
SN - 0263-0346
VL - 30
SP - 319
EP - 324
JO - Laser and Particle Beams
JF - Laser and Particle Beams
IS - 2
ER -