Atomic-scale fatigue mechanism of ferroelectric tunnel junctions

Ferroelectric tunnel junctions (FTJs) are promising candidates for next-generation memories due to fast read/ write speeds and low-power consumptions. Here, we investigate resistance fatigue of FTJs, which is performed on Pt/BaTiO3/Nb:SrTiO3 devices. By direct observations of the 5-unit cell-thick BaTiO3 barrier with high-angle annular dark-field imaging and electron energy loss spectroscopy, oxygen vacancies are found to aggregate at the Pt/ BaTiO3 interface during repetitive switching, leading to a ferroelectric dead layer preventing domain nucleation and growth. Severe oxygen deficiency also makes BaTiO3 lattices energetically unfavorable and lastly induces a destruction of local perovskite structure of the barrier. Ferroelectric properties are thus degraded, which reduces barrier contrast between ON and OFF states and smears electroresistance characteristics of Pt/BaTiO3/Nb:SrTiO3 FTJs. These results reveal an atomic-scale fatigue mechanism of ultrathin ferroelectric barriers associated with the aggregation of charged defects, facilitating the design of reliable FTJs and ferroelectric nanoelectronic devices for practical applications.