Abstract
In this paper, we report on an attempt to separate single crystal (SC) diamond film from diamond substrate by femtosecond laser treatment and electrochemical etching techniques. Firstly, femtosecond laser was focused on about 20 μm below the surface of diamond substrate to form a non-diamond layer. Secondly, a thick SC diamond film was grown on this substrate by microwave plasma chemical vapor deposition system. Finally, an electrochemical etching treatment was performed to separate the SC diamond film from its substrate. The results indicate that femtosecond laser technique has provided a potential way for the separation of grown diamond film from its substrate.
| Original language | English |
|---|---|
| Pages (from-to) | 69-74 |
| Number of pages | 6 |
| Journal | Diamond and Related Materials |
| Volume | 63 |
| DOIs | |
| State | Published - 1 Mar 2016 |
Keywords
- Chemical vapor deposition
- Diamond film
- Semiconductor
- Single crystal growth
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