Annealing temperature on contact properties between nickel film and hydrogen-terminated single crystal diamond

Pengfei Zhang; Shaopeng Zhang; Weidong Chen; Shufang Yan; Wen Ma; Hong Xing Wang

doi:10.3390/coatings10090876

Annealing temperature on contact properties between nickel film and hydrogen-terminated single crystal diamond

Pengfei Zhang
, Shaopeng Zhang
, Weidong Chen
, Shufang Yan
, Wen Ma
, Hong Xing Wang

Faculty of Electronic and Information Engineering

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

Ohmic contact of nickel on hydrogen-terminated single-crystal diamond film was investigated with an annealing temperature ranging from room temperature to 750 °C in hydrogen atmosphere. Nickel film was deposited on a hydrogen-terminated single-crystal diamond surface with gold film in order to protect it from oxidation. Contact properties between nickel and hydrogen-terminated single crystal diamond were measured by a circular transmission line model. The lowest specific contact resistivity was 7.82 × 10^-5 ω cm² at annealing temperature of 750 °C, indicating good ohmic contact, which reveals improved thermal stability by increasing temperature.

Original language	English
Article number	876
Journal	Coatings
Volume	10
Issue number	9
DOIs	https://doi.org/10.3390/coatings10090876
State	Published - Sep 2020

Keywords

CTLM
H-diamond
I-V
Ohmic contact
Specific contact resistance

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10.3390/coatings10090876

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@article{f89fa2e674ab47abb83794a8752c4828,

title = "Annealing temperature on contact properties between nickel film and hydrogen-terminated single crystal diamond",

abstract = "Ohmic contact of nickel on hydrogen-terminated single-crystal diamond film was investigated with an annealing temperature ranging from room temperature to 750 °C in hydrogen atmosphere. Nickel film was deposited on a hydrogen-terminated single-crystal diamond surface with gold film in order to protect it from oxidation. Contact properties between nickel and hydrogen-terminated single crystal diamond were measured by a circular transmission line model. The lowest specific contact resistivity was 7.82 × 10-5 ω cm2 at annealing temperature of 750 °C, indicating good ohmic contact, which reveals improved thermal stability by increasing temperature.",

keywords = "CTLM, H-diamond, I-V, Ohmic contact, Specific contact resistance",

author = "Pengfei Zhang and Shaopeng Zhang and Weidong Chen and Shufang Yan and Wen Ma and Wang, \{Hong Xing\}",

note = "Publisher Copyright: {\textcopyright} 2020 by the authors.",

year = "2020",

month = sep,

doi = "10.3390/coatings10090876",

language = "英语",

volume = "10",

journal = "Coatings",

issn = "2079-6412",

publisher = "Multidisciplinary Digital Publishing Institute (MDPI)",

number = "9",

}

TY - JOUR

T1 - Annealing temperature on contact properties between nickel film and hydrogen-terminated single crystal diamond

AU - Zhang, Pengfei

AU - Zhang, Shaopeng

AU - Chen, Weidong

AU - Yan, Shufang

AU - Ma, Wen

AU - Wang, Hong Xing

PY - 2020/9

Y1 - 2020/9

N2 - Ohmic contact of nickel on hydrogen-terminated single-crystal diamond film was investigated with an annealing temperature ranging from room temperature to 750 °C in hydrogen atmosphere. Nickel film was deposited on a hydrogen-terminated single-crystal diamond surface with gold film in order to protect it from oxidation. Contact properties between nickel and hydrogen-terminated single crystal diamond were measured by a circular transmission line model. The lowest specific contact resistivity was 7.82 × 10-5 ω cm2 at annealing temperature of 750 °C, indicating good ohmic contact, which reveals improved thermal stability by increasing temperature.

AB - Ohmic contact of nickel on hydrogen-terminated single-crystal diamond film was investigated with an annealing temperature ranging from room temperature to 750 °C in hydrogen atmosphere. Nickel film was deposited on a hydrogen-terminated single-crystal diamond surface with gold film in order to protect it from oxidation. Contact properties between nickel and hydrogen-terminated single crystal diamond were measured by a circular transmission line model. The lowest specific contact resistivity was 7.82 × 10-5 ω cm2 at annealing temperature of 750 °C, indicating good ohmic contact, which reveals improved thermal stability by increasing temperature.

KW - CTLM

KW - H-diamond

KW - I-V

KW - Ohmic contact

KW - Specific contact resistance

UR - https://www.scopus.com/pages/publications/85090908219

U2 - 10.3390/coatings10090876

DO - 10.3390/coatings10090876

M3 - 文章

AN - SCOPUS:85090908219

SN - 2079-6412

VL - 10

JO - Coatings

JF - Coatings

IS - 9

M1 - 876

ER -

Annealing temperature on contact properties between nickel film and hydrogen-terminated single crystal diamond

Abstract

Keywords

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