Analysis on radiant energy centralization in the ultraviolet stereolithography

Based on the optical-wave theory, the focusing energy field of the ultraviolet light in the stereolithography is analyzed. The reflect focusing theory that spherical continuous wave radiated by point light source is reflected from concave ellipsoidal surface is enucleated, and the axial and lateral optical energy distributions of the reflecting optical wave field are shown up. The analysis indicates that the intensity of the focus rises with the eccentricity increasing; the distributing curve of the intensity along optical axis is approximate Gauss curve; the distribution of the optical energy presents hyperboloidal body form in the focal field; the side distributing curve of the intensity submits to normal distribution in the focal plane. For utilizing the ultraviolet radiant energy in the stereolithography effectively, the research supplies theoretical basis and important guidance for the optical design of stereolithography.