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AlGaN/GaN高电子迁移率晶体管器件中子位移损伤效应及机理

Translated title of the contribution: Neutron-induced displacement damage effect and mechanism of AlGaN/GaN high electron mobility transistor
  • Rui Jing Hao
  • , Hong Xia Guo
  • , Xiao Yu Pan
  • , Ling Lü
  • , Zhi Feng Lei
  • , Bo Li
  • , Xiang Li Zhong
  • , Xiao Ping Ouyang
  • , Shi Jian Dong
  • XiangTan University
  • Electronic Product Reliability and Environmental Testing Research Institute
  • Northwest Institute of Nuclear Technology
  • Xi'an University

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

In this paper, neutron-induced displacement damage effects of AlGaN/GaN High electron mobility ransistor (HEMT) device and heterostructure on the Xi'an pulse reactor are studied. The equivalent 1 MeV neutron fluence is 1 × 1014 n/cm2. The direct-current characteristics and low frequency noise characteristics of the HEMT deviceare used to characterize the performances before and after being irradiated by the neutrons, and then the experimental results are analyzed theoretically. The analysis results showed that the displacement damage effect caused by the neutron irradiation will introduce the bulk defects into the device. The bulk defects at the channel cause the electrical performance of the device to degrade through trapping electrons and scattering electrons, which are mainly manifested as the drift of positive threshold voltage, the decrease of output saturation drain current, and the increase of gate leakage current. In order to further confirm the effect of neutron irradiation on the defect density of the device, we implement the low-frequency noise test and the calculation of the device, and the results show that the defect density at the channel of the device increases from 1.78 × 1012 cm-3·eV-1 to 1.66 × 1014 cm-3·eV-1, which is consistent with the results of the electrical characteristics test, indicating that the new defects introduced by neutron irradiation do degrade the electrical performance of the device. At the same time, the capacitor-voltage test is also carried out to analyze the Schottky heterojunctions before and after neutron irradiation. It is found that the channel carrier concentration is significantly reduced after irradiation, and the flat band voltage also drifts positively. The analysis shows that after irradiating the device with neutrons, a large number of defects will be generated in the channel, and these defects will affect the concentration and mobility of the channel carriers, which in turn will influence the electrical performance of the device. These experimental results can be used for designing the AlGaN/GaN high electron mobility transistor for radiationhard reinforcement.

Translated title of the contributionNeutron-induced displacement damage effect and mechanism of AlGaN/GaN high electron mobility transistor
Original languageChinese (Traditional)
Article number207301
JournalWuli Xuebao/Acta Physica Sinica
Volume69
Issue number20
DOIs
StatePublished - 20 Oct 2020
Externally publishedYes

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