Adsorption and Diffusion Behavior of Cl- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2)

Bin Zhang; Li Liu; Tianshu Li; Ying Li; Mingkai Lei; Fuhui Wang

doi:10.1016/j.jmst.2015.10.016

Adsorption and Diffusion Behavior of Cl^- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2)

Bin Zhang
, Li Liu
, Tianshu Li
, Ying Li
, Mingkai Lei
, Fuhui Wang

Dalian University of Technology
CAS - Institute of Metal Research

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

The adsorption and diffusion behavior of Cl^- on sputtering Fe-20Cr nanocrystalline (NC) thin film compared with corresponding coarse crystalline (CC) alloy has been studied in HCl+NaCl solution (pH=2, [Cl^-]=0.1 mol/L) by electrochemical techniques, X-ray photoelectron spectroscopy (XPS) and the first-principles calculations. The XPS results show that adsorption and diffusion of Cl^- in the passive film has been inhibited on NC thin film. Ultra-violet photoelectron spectroscopy (UPS) results show that the work function Φ_s of NC thin film (4.7 eV) is higher than that of CC alloy (4.5 eV). The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work.

Original language	English
Pages (from-to)	1198-1206
Number of pages	9
Journal	Journal of Materials Science and Technology
Volume	31
Issue number	12
DOIs	https://doi.org/10.1016/j.jmst.2015.10.016
State	Published - 1 Dec 2015
Externally published	Yes

Keywords

Cl adsorption
First principles calculations
Nanocrystalline
XPS (X-ray photoelectron spectroscopy)

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10.1016/j.jmst.2015.10.016

Cite this

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title = "Adsorption and Diffusion Behavior of Cl- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2)",

abstract = "The adsorption and diffusion behavior of Cl- on sputtering Fe-20Cr nanocrystalline (NC) thin film compared with corresponding coarse crystalline (CC) alloy has been studied in HCl+NaCl solution (pH=2, [Cl-]=0.1 mol/L) by electrochemical techniques, X-ray photoelectron spectroscopy (XPS) and the first-principles calculations. The XPS results show that adsorption and diffusion of Cl- in the passive film has been inhibited on NC thin film. Ultra-violet photoelectron spectroscopy (UPS) results show that the work function Φs of NC thin film (4.7 eV) is higher than that of CC alloy (4.5 eV). The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work.",

keywords = "Cl adsorption, First principles calculations, Nanocrystalline, XPS (X-ray photoelectron spectroscopy)",

author = "Bin Zhang and Li Liu and Tianshu Li and Ying Li and Mingkai Lei and Fuhui Wang",

note = "Publisher Copyright: {\textcopyright} 2015 .",

year = "2015",

month = dec,

day = "1",

doi = "10.1016/j.jmst.2015.10.016",

language = "英语",

volume = "31",

pages = "1198--1206",

journal = "Journal of Materials Science and Technology",

issn = "1005-0302",

publisher = "Chinese Society of Metals",

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}

TY - JOUR

T1 - Adsorption and Diffusion Behavior of Cl- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2)

AU - Zhang, Bin

AU - Liu, Li

AU - Li, Tianshu

AU - Li, Ying

AU - Lei, Mingkai

AU - Wang, Fuhui

PY - 2015/12/1

Y1 - 2015/12/1

N2 - The adsorption and diffusion behavior of Cl- on sputtering Fe-20Cr nanocrystalline (NC) thin film compared with corresponding coarse crystalline (CC) alloy has been studied in HCl+NaCl solution (pH=2, [Cl-]=0.1 mol/L) by electrochemical techniques, X-ray photoelectron spectroscopy (XPS) and the first-principles calculations. The XPS results show that adsorption and diffusion of Cl- in the passive film has been inhibited on NC thin film. Ultra-violet photoelectron spectroscopy (UPS) results show that the work function Φs of NC thin film (4.7 eV) is higher than that of CC alloy (4.5 eV). The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work.

AB - The adsorption and diffusion behavior of Cl- on sputtering Fe-20Cr nanocrystalline (NC) thin film compared with corresponding coarse crystalline (CC) alloy has been studied in HCl+NaCl solution (pH=2, [Cl-]=0.1 mol/L) by electrochemical techniques, X-ray photoelectron spectroscopy (XPS) and the first-principles calculations. The XPS results show that adsorption and diffusion of Cl- in the passive film has been inhibited on NC thin film. Ultra-violet photoelectron spectroscopy (UPS) results show that the work function Φs of NC thin film (4.7 eV) is higher than that of CC alloy (4.5 eV). The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work.

KW - Cl adsorption

KW - First principles calculations

KW - Nanocrystalline

KW - XPS (X-ray photoelectron spectroscopy)

UR - https://www.scopus.com/pages/publications/84951282176

U2 - 10.1016/j.jmst.2015.10.016

DO - 10.1016/j.jmst.2015.10.016

M3 - 文章

AN - SCOPUS:84951282176

SN - 1005-0302

VL - 31

SP - 1198

EP - 1206

JO - Journal of Materials Science and Technology

JF - Journal of Materials Science and Technology

IS - 12

ER -

Adsorption and Diffusion Behavior of Cl^- on Sputtering Fe-20Cr Nanocrystalline Thin Film in Acid Solution (pH=2)

Abstract

Keywords

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