TY - JOUR
T1 - Active Thermal Management of GaN-on-SiC HEMT With Embedded Microfluidic Cooling
AU - Ye, Yuxin
AU - Wu, Mei
AU - Kong, Yanmei
AU - Liu, Ruiwen
AU - Yang, Ling
AU - Zheng, Xuefeng
AU - Jiao, Binbin
AU - Ma, Xiaohua
AU - Bao, Weimin
AU - Hao, Yue
N1 - Publisher Copyright:
© 1963-2012 IEEE.
PY - 2022/10/1
Y1 - 2022/10/1
N2 - In recent decades, gallium nitride (GaN) high-electron-mobility transistor (HEMT) has become increasingly popular for microwave applications due to its wide bandgap and high saturated electron velocity. However, self-heating inhibits the improvement of its electrical characteristics and reduces device reliability. In this study, a thermoelectric analysis based on embedded microfluidic cooling is performed. By embedding the microchannel into the silicon carbide (SiC) substrate, the coolant can be introduced directly to realize active near junction cooling. According to the thermal resistance model, embedded cooling shortens the thermal path and enhances the capacity of heat convection, and the improvement in the HEMT output characteristics is also verified experimentally. The saturation current increases by 19.5%, and the heat flux of the gates reaches 6349.2 W/mm2 at 70 mL/min, which is 1172% higher than that of traditional remote cooling. The maximum temperature is only 67.4 °C. Therefore, the embedded microfluidic cooling scheme can markedly suppress the self-heating effect and further explore the electrical potential of GaN-based devices.
AB - In recent decades, gallium nitride (GaN) high-electron-mobility transistor (HEMT) has become increasingly popular for microwave applications due to its wide bandgap and high saturated electron velocity. However, self-heating inhibits the improvement of its electrical characteristics and reduces device reliability. In this study, a thermoelectric analysis based on embedded microfluidic cooling is performed. By embedding the microchannel into the silicon carbide (SiC) substrate, the coolant can be introduced directly to realize active near junction cooling. According to the thermal resistance model, embedded cooling shortens the thermal path and enhances the capacity of heat convection, and the improvement in the HEMT output characteristics is also verified experimentally. The saturation current increases by 19.5%, and the heat flux of the gates reaches 6349.2 W/mm2 at 70 mL/min, which is 1172% higher than that of traditional remote cooling. The maximum temperature is only 67.4 °C. Therefore, the embedded microfluidic cooling scheme can markedly suppress the self-heating effect and further explore the electrical potential of GaN-based devices.
KW - Embedded microfluidic cooling
KW - gallium nitride (GaN) high-electron-mobility transistor (HEMT)
KW - self-heating effect
UR - https://www.scopus.com/pages/publications/85137602376
U2 - 10.1109/TED.2022.3195482
DO - 10.1109/TED.2022.3195482
M3 - 文章
AN - SCOPUS:85137602376
SN - 0018-9383
VL - 69
SP - 5470
EP - 5475
JO - IEEE Transactions on Electron Devices
JF - IEEE Transactions on Electron Devices
IS - 10
ER -