A Study of Al₂O₃/MgO Composite Films Deposited by FCVA for Thin-Film Encapsulation

Al₂O₃ and MgO composite (Al₂O₃/MgO) films were rapidly deposited at low temperatures using filtered cathode vacuum arc (FCVA) technology, aiming to achieve good barrier properties for flexible organic light emitting diodes (OLED) thin-film encapsulation (TFE). As the thickness of the MgO layer decreases, the degree of crystallinity decreases gradually. The 3:2 Al₂O₃:MgO layer alternation type has the best water vapor shielding performance, and the water vapor transmittance (WVTR) is 3.26 × 10⁻⁴ g·m⁻²·day⁻¹ at 85 °C and 85% R.H, which is about 1/3 of that of a single layer of Al₂O₃ film. Under the action of ion deposition, too many layers will cause internal defects in the film, resulting in decreased shielding ability. The surface roughness of the composite film is very low, which is about 0.3–0.5 nm depending on its structure. In addition, the visible light transmittance of the composite film is lower than that of a single film and increases with the increase in the number of layers.