A single-pole double-throw (SPDT) circuit using lateral metal-contact micromachined switches

  • M. Tang
  • , A. Q. Liu
  • , A. Agarwal
  • , Z. S. Liu
  • , C. Lu

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

A dc 6 GHz single-pole double-throw (SPDT) switching circuit that employs lateral metal-contact micromachined switches is investigated. The lateral metal-contact switch consists of a set of quasi-finite ground coplanar waveguide (FGCPW) transmission lines and a high-aspect-ratio cantilever beam. A single-pole single-throw (SPST) lateral micromachined switch has an insertion loss of 0.08 dB and a return loss of 32 dB at 5 GHz. The isolation is 32 dB at 5 GHz. The measured insertion loss of the SPDT switching circuit is below 0.75 dB, whereas the return loss is higher than 19 dB at 5 GHz. The isolation at 5 GHz is 33 dB. Pull-in voltage of the switch is 23.3 V and switching time is 35 μs. The size of the SPDT switching circuit is 1.2 mm × 1.5 mm. A main advantage of this circuit structure is simple fabrication process with high yield (>90%) based on the deep reactive ion etching (DRIE) technique of silicon-on-insulator (SOI) wafer and shadow mask technology.

Original languageEnglish
Pages (from-to)187-196
Number of pages10
JournalSensors and Actuators A: Physical
Volume121
Issue number1
DOIs
StatePublished - 31 May 2005
Externally publishedYes

Keywords

  • DRIE
  • Lateral contact switch
  • RF MEMS
  • SPDT circuit

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