Abstract
Using the location-dependent growth strain, a chemomechanical model is developed for the analysis of the stress evolution and distribution in the viscoplastic oxide scale during higherature oxidation. The problem of oxidizing a semi-infinite substrate is formulated and solved. The numerical results reveal high compressive stress and significant stress gradient. The maximum stress is at the oxide/substrate interface and the minimum stress at the oxygen/oxide interface in short oxidation time, while the maximum stress is no longer at the oxide/substrate interface in long oxidation time. The stress evolutions at different locations are also presented. The predicted results agree well with the experimental data.
| Original language | English |
|---|---|
| Article number | 051008 |
| Journal | Journal of Applied Mechanics, Transactions ASME |
| Volume | 83 |
| Issue number | 5 |
| DOIs | |
| State | Published - 1 May 2016 |
Keywords
- Oxide scale
- diffusion
- growth strain
- oxidation
- viscoplastic
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