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基于氧阻聚效应的陶瓷面成形工艺优化研究

Translated title of the contribution: Process Optimization of Oxygen-inhibition-based Ceramic Mask-projection Stereolithography
  • Xiaodong Liu
  • , Qin Lian
  • , Dichen Li
  • , Yi Cao
  • , Shanghua Wu
  • , Xiangquan Wu
  • , Jiali Meng
  • , Xiaoning He
  • Xi'an Jiaotong University
  • Guangdong University of Technology
  • Xidian University

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

The application of oxygen-inhibition leads to significant enhance of the forming speed and precision of mask-projection stereolithography technology. A mask-projection stereolithography system with a controlled oxygen set and the self-developed Al2O3 slurry have been applied to explore the influence of oxygen concentration and PDMS film thickness on the separation force between the cured layer and the surface of PDMS film. The optimal thickness of 0.3mm of PDMS film is selected to find how the oxygen work on the size accuracy, shrinkage and mechanical strength of ceramic parts. The oxygen-inhibition application significantly lessened the separation forces in the ceramic curing period, but had no effect on the bonding strength (~175 MPa) of ceramic parts. Meanwhile, the appropriate oxygen concentration had capability of getting good accuracy and surface quality of the parts. Orthogonal experiments are carried out to determine the optimal process parameters of the porous structures (including oxygen concentration, light exposure intensity and slice thickness), the formed morphological structures under the optimal oxygen concentration (about 40%) were better than that of under air condition (the oxygen concentration, about 20%),the maximum size deviation is reduced by 45%.

Translated title of the contributionProcess Optimization of Oxygen-inhibition-based Ceramic Mask-projection Stereolithography
Original languageChinese (Traditional)
Pages (from-to)224-232
Number of pages9
JournalJixie Gongcheng Xuebao/Chinese Journal of Mechanical Engineering
Volume55
Issue number9
DOIs
StatePublished - 5 May 2019

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